Nanoscaled C, Ni, Pt thin films

Wan Yu Wu, Chia Wei Hsu, Jyh Ming Ting

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

We have investigated the growth and characteristics of nanoscaled thin films of carbon, nickel, and platinum. The nanoscaled thin films were deposited on Si and quartz substrates with or without a surface layer of carbon, nickel, or platinum using a DC magnetron sputter deposition technique. The thicknesses, which were determined using ellipsometry, are all less than 10 nm. The film structures were examined using glazing angle incident x-ray diffractometry and Raman spectroscopy. The electrical and optical properties were determined using a four point probe technique and UV-VIS-IR spectrometry, respectively.

Original languageEnglish
Pages (from-to)29-34
Number of pages6
JournalJournal of Nano Research
Volume6
DOIs
Publication statusPublished - 2009 Jun 30

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Physics and Astronomy(all)

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