Nitrogen incorporated ultrananocrystalline diamond microstructures from bias-enhanced microwave N₂/CH₄-plasma chemical vapor deposition

Engineering & Materials Science

• Chemical vapor deposition 100%
• Diamonds 85%
• Plasmas 79%
• Microwaves 75%
• Diamond films 74%
• Microstructure 57%
• Electric properties 26%
• Needles 25%
• Amorphous carbon 18%
• Field emission 15%
• Microstructural evolution 15%
• Gas mixtures 13%
• Electric Conductivity 13%
• Film thickness 13%
• Nucleation 12%
• Grain boundaries 12%

Physics & Astronomy

• diamonds 68%
• vapor deposition 65%
• nitrogen 62%
• microwaves 57%
• diamond films 53%
• microstructure 50%
• needles 24%
• graphite 21%
• electrical properties 17%
• sheaths 12%
• gas mixtures 11%
• proportion 11%
• field emission 11%
• film thickness 10%
• rods 10%
• nucleation 9%
• grain boundaries 9%
• carbon 8%
• electrical resistivity 7%

Chemical Compounds

• Diamond 81%
• Chemical Vapour Deposition 77%
• Microwave 69%
• Microstructure 57%
• Nitrogen 51%
• Liquid Film 29%
• Electrical Property 14%
• Graphite 12%
• Acicular Crystal 11%
• Plasma Chemical Vapour Deposition 11%
• Molecular Cluster 11%
• Time 9%
• Grain Boundary 8%
• Field Emission 8%
• Nucleation 7%
• Amorphous Material 5%
• Conductivity 5%
• Gas 4%
• Carbon Atom 4%
• Mixture 3%
• Surface 2%