Novel methods of nanoscale wire formation

Sharka M. Prokes, Kang L. Wang

Research output: Contribution to journalArticlepeer-review

107 Citations (Scopus)

Abstract

One of the most popular techniques in used to produce artificial structure of quantum wires with sub-100-nm features is nanofabrication. This technique involves the formation of a pattern on material and the transfer of this pattern to form nanometer-sized features. In general, the pattern is formed by selective irradiation of a photoresist, using electrons, ions, or ultraviolet light. The patterned regions of the resist are then dissolved in a specific solvent. The final nanoscale features are formed in the underlying material by the use of dry etching techniques.

Original languageEnglish
Pages (from-to)13-19
Number of pages7
JournalMRS Bulletin
Volume24
Issue number8
DOIs
Publication statusPublished - 1999 Aug

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Physical and Theoretical Chemistry

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