Novel methods of nanoscale wire formation

One of the most popular techniques in used to produce artificial structure of quantum wires with sub-100-nm features is nanofabrication. This technique involves the formation of a pattern on material and the transfer of this pattern to form nanometer-sized features. In general, the pattern is formed by selective irradiation of a photoresist, using electrons, ions, or ultraviolet light. The patterned regions of the resist are then dissolved in a specific solvent. The final nanoscale features are formed in the underlying material by the use of dry etching techniques.