Novel polymeric surfactants for improving chemical mechanical polishing performance of silicon oxide

Wei Tsu Tseng, Ping Lin Kuo, Chin Lung Liao, Rick Lu, Jen Fin Lin

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

We investigated the impacts of novel surfactants on oxide chemical mechanical polishing (CMP) performance. Silica-based potassium hydroxide was formulated for this study. Two polymeric surfactants, methyl methacrylate (MMA)-based CHE and silixane-based SHE, were added to the slurry for evaluation. Particle size, viscosity, surface tension, and contact angle of slurries were characterized. Without surfactant, the silica-based slurry withstood up to 8.5 wt% of solid loading before the silica abrasives segregate and settle. With the addition of surfactant, however, the slurry held up to 15 wt% of solids without segregation. The CHE-added slurry yielded higher viscosity and higher oxide CMP removal rate than SHE-added slurry, while the latter exhibited better colloidal dispersion characteristics and lower within-wafer nonuniformity.

Original languageEnglish
Pages (from-to)G42-G45
JournalElectrochemical and Solid-State Letters
Volume4
Issue number5
DOIs
Publication statusPublished - 2001 May

All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)
  • Materials Science(all)
  • Physical and Theoretical Chemistry
  • Electrochemistry
  • Electrical and Electronic Engineering

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