Novel polymeric thin film deposition system: Injector-apparatus/PECVD reactor

Mario J. Cazeca, Changshu Kuo, Jayant Kumar

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


A monomer injection apparatus has been developed to be used with a plasma enhanced chemical vapor deposition (PECVD) reactor to deposit polymeric thin films from precursor monomers with boiling points ranging from low to very high. The system (PECVD reactor-injection apparatus) allows deposition of layered, as well as doped, polymeric thin films. Thin film deposition from a mixture of two monomers with very different boiling points - thiophene and 2,3-dihydrothieno [3,4-b]-1,4-dioxin (EDOT) - and other monomers like dicyclopentadiene (DCPD) and 2-chloro-p-xylene has been performed to demonstrate the capabilities of the deposition system. Thermal analysis of the deposited thin film using microthermal analysis (μTA™) and differential scanning calorimetry performed on deposited films is also presented. The injection apparatus associated with a PECVD reactor proved to be a very versatile tool for novel polymeric thin film deposition.

Original languageEnglish
Pages (from-to)1447-1458
Number of pages12
JournalJournal of Macromolecular Science - Pure and Applied Chemistry
Volume41 A
Issue number12
Publication statusPublished - 2004 Nov

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • General Chemistry
  • Polymers and Plastics
  • Materials Chemistry


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