A monomer injection apparatus has been developed to be used with a plasma enhanced chemical vapor deposition (PECVD) reactor to deposit polymeric thin films from precursor monomers with boiling points ranging from low to very high. The system (PECVD reactor-injection apparatus) allows deposition of layered, as well as doped, polymeric thin films. Thin film deposition from a mixture of two monomers with very different boiling points - thiophene and 2,3-dihydrothieno [3,4-b]-1,4-dioxin (EDOT) - and other monomers like dicyclopentadiene (DCPD) and 2-chloro-p-xylene has been performed to demonstrate the capabilities of the deposition system. Thermal analysis of the deposited thin film using microthermal analysis (μTA™) and differential scanning calorimetry performed on deposited films is also presented. The injection apparatus associated with a PECVD reactor proved to be a very versatile tool for novel polymeric thin film deposition.
|Number of pages||12|
|Journal||Journal of Macromolecular Science - Pure and Applied Chemistry|
|Publication status||Published - 2004 Nov|
All Science Journal Classification (ASJC) codes
- Ceramics and Composites
- Polymers and Plastics
- Materials Chemistry