Novel positive-working and aqueous-base-developable photosensitive poly(imide benzoxazole) precursor

Lien-Chung Hsu, Hui Tzu Chen, Shih Jung Tsai

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

A novel positive-working and aqueous-base-developable photosensitive polydmide benzoxazole) precursor based on a poly(amic acid hydroxyamide) bearing phenolic hydroxyl groups and carboxylic acid groups, a diazonaphthoquinone (DNQ) photosensitive compound, and a solvent was developed. Poly(amic acid hydroxyamide) was prepared through the polymerization of 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, trimellitic anhydride chloride, and 4,4′-oxydibenzoyl chloride. Subsequently, the thermal cyclization of the poly(amic acid hydroxyamide) precursor at 350°C produced the corresponding polydmide benzoxazole). The inherent viscosity of the precursor polymer was 0.17 dL/g. The cyclized poly(imide benzoxazole) showed a high glass-transition temperature of 372°C and 5% weight loss temperatures of 535°C in nitrogen and 509°C in air. The structures of the precursor polymer and the fully cyclized polymer were characterized with Fourier transform infrared and 1H NMR. The photosensitive polyimide precursor containing 25 wt % DNQ photoactive compound showed a sensitivity of 256 mJ/cm2 and a contrast of 1.14 in a 3-μm film with a 0.6 wt % tetramethylammonium hydroxide developer. A pattern with a resolution of 5 μm was obtained from this composition.

Original languageEnglish
Pages (from-to)5990-5998
Number of pages9
JournalJournal of Polymer Science, Part A: Polymer Chemistry
Volume42
Issue number23
DOIs
Publication statusPublished - 2004 Dec 1

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Benzoxazoles
Imides
Polymers
Acids
Chlorides
Bearings (structural)
Cyclization
Carboxylic Acids
Carboxylic acids
Polyimides
Hydroxyl Radical
Fourier transforms
Nitrogen
Polymerization
Nuclear magnetic resonance
Viscosity
Infrared radiation
Air
Chemical analysis
Temperature

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

Cite this

@article{17c492d407e94997b32e7c72816accb1,
title = "Novel positive-working and aqueous-base-developable photosensitive poly(imide benzoxazole) precursor",
abstract = "A novel positive-working and aqueous-base-developable photosensitive polydmide benzoxazole) precursor based on a poly(amic acid hydroxyamide) bearing phenolic hydroxyl groups and carboxylic acid groups, a diazonaphthoquinone (DNQ) photosensitive compound, and a solvent was developed. Poly(amic acid hydroxyamide) was prepared through the polymerization of 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, trimellitic anhydride chloride, and 4,4′-oxydibenzoyl chloride. Subsequently, the thermal cyclization of the poly(amic acid hydroxyamide) precursor at 350°C produced the corresponding polydmide benzoxazole). The inherent viscosity of the precursor polymer was 0.17 dL/g. The cyclized poly(imide benzoxazole) showed a high glass-transition temperature of 372°C and 5{\%} weight loss temperatures of 535°C in nitrogen and 509°C in air. The structures of the precursor polymer and the fully cyclized polymer were characterized with Fourier transform infrared and 1H NMR. The photosensitive polyimide precursor containing 25 wt {\%} DNQ photoactive compound showed a sensitivity of 256 mJ/cm2 and a contrast of 1.14 in a 3-μm film with a 0.6 wt {\%} tetramethylammonium hydroxide developer. A pattern with a resolution of 5 μm was obtained from this composition.",
author = "Lien-Chung Hsu and Chen, {Hui Tzu} and Tsai, {Shih Jung}",
year = "2004",
month = "12",
day = "1",
doi = "10.1002/pola.20438",
language = "English",
volume = "42",
pages = "5990--5998",
journal = "Journal of Polymer Science, Part A: Polymer Chemistry",
issn = "0887-624X",
publisher = "John Wiley and Sons Inc.",
number = "23",

}

Novel positive-working and aqueous-base-developable photosensitive poly(imide benzoxazole) precursor. / Hsu, Lien-Chung; Chen, Hui Tzu; Tsai, Shih Jung.

In: Journal of Polymer Science, Part A: Polymer Chemistry, Vol. 42, No. 23, 01.12.2004, p. 5990-5998.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Novel positive-working and aqueous-base-developable photosensitive poly(imide benzoxazole) precursor

AU - Hsu, Lien-Chung

AU - Chen, Hui Tzu

AU - Tsai, Shih Jung

PY - 2004/12/1

Y1 - 2004/12/1

N2 - A novel positive-working and aqueous-base-developable photosensitive polydmide benzoxazole) precursor based on a poly(amic acid hydroxyamide) bearing phenolic hydroxyl groups and carboxylic acid groups, a diazonaphthoquinone (DNQ) photosensitive compound, and a solvent was developed. Poly(amic acid hydroxyamide) was prepared through the polymerization of 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, trimellitic anhydride chloride, and 4,4′-oxydibenzoyl chloride. Subsequently, the thermal cyclization of the poly(amic acid hydroxyamide) precursor at 350°C produced the corresponding polydmide benzoxazole). The inherent viscosity of the precursor polymer was 0.17 dL/g. The cyclized poly(imide benzoxazole) showed a high glass-transition temperature of 372°C and 5% weight loss temperatures of 535°C in nitrogen and 509°C in air. The structures of the precursor polymer and the fully cyclized polymer were characterized with Fourier transform infrared and 1H NMR. The photosensitive polyimide precursor containing 25 wt % DNQ photoactive compound showed a sensitivity of 256 mJ/cm2 and a contrast of 1.14 in a 3-μm film with a 0.6 wt % tetramethylammonium hydroxide developer. A pattern with a resolution of 5 μm was obtained from this composition.

AB - A novel positive-working and aqueous-base-developable photosensitive polydmide benzoxazole) precursor based on a poly(amic acid hydroxyamide) bearing phenolic hydroxyl groups and carboxylic acid groups, a diazonaphthoquinone (DNQ) photosensitive compound, and a solvent was developed. Poly(amic acid hydroxyamide) was prepared through the polymerization of 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, trimellitic anhydride chloride, and 4,4′-oxydibenzoyl chloride. Subsequently, the thermal cyclization of the poly(amic acid hydroxyamide) precursor at 350°C produced the corresponding polydmide benzoxazole). The inherent viscosity of the precursor polymer was 0.17 dL/g. The cyclized poly(imide benzoxazole) showed a high glass-transition temperature of 372°C and 5% weight loss temperatures of 535°C in nitrogen and 509°C in air. The structures of the precursor polymer and the fully cyclized polymer were characterized with Fourier transform infrared and 1H NMR. The photosensitive polyimide precursor containing 25 wt % DNQ photoactive compound showed a sensitivity of 256 mJ/cm2 and a contrast of 1.14 in a 3-μm film with a 0.6 wt % tetramethylammonium hydroxide developer. A pattern with a resolution of 5 μm was obtained from this composition.

UR - http://www.scopus.com/inward/record.url?scp=10044259559&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=10044259559&partnerID=8YFLogxK

U2 - 10.1002/pola.20438

DO - 10.1002/pola.20438

M3 - Article

VL - 42

SP - 5990

EP - 5998

JO - Journal of Polymer Science, Part A: Polymer Chemistry

JF - Journal of Polymer Science, Part A: Polymer Chemistry

SN - 0887-624X

IS - 23

ER -