Novel Positive-Working Aqueous-Base Developable Photosensitive Polyimide Precursors Based on Diazonaphthoquinone-Capped Polyamic Esters

Steve Lien Chung Hsu, Po I. Lee, Jinn Shing King, Jyh Long Jeng

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

Novel positive-working aqueous-base developable photosensitive polyimide (PSPI) precursors based on partially diazonaphthoquinone (DNQ)-capped polyamic esters bearing phenolic hydroxyl groups and a DNQ photosensitive compound (PIC-3) were developed. The partially DNQ capped polyamic esters were prepared from an esterification reaction of 1,2-naphthoquinone diazide-5-sulfonyl chloride with the polyamic esters. The partially DNQ capped polyamic esters decreased the dark film loss effectively in the aqueous-base developer and were able to make thicker film resists compared to the uncapped polyamic esters. The 25 mol % DNQ-capped BisAPAF-PMDA polyamic ester and BisAPAF-ODPA polyamic ester containing 25 wt % PIC-3 photosensitive compound showed a sensitivity of 176 and 185 mJ/cm2, and a contrast of 1.68 and 1.02, respectively, in a 3-μm film with 1.25 wt % tetramethylammonium hydroxide developer. A pattern with a resolution of 5 μm was obtained from both PSPI precursor compositions.

Original languageEnglish
Pages (from-to)2293-2300
Number of pages8
JournalJournal of Applied Polymer Science
Volume90
Issue number8
DOIs
Publication statusPublished - 2003 Nov 21

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Surfaces, Coatings and Films
  • Polymers and Plastics
  • Materials Chemistry

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