Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing

Fei Bin Hsiao; Di Bao Wang; Chun Ping Jen; Yung Chun Lee; Cheng Hsin Chuang

Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing

Fei Bin Hsiao
, Di Bao Wang
, Chun Ping Jen
, Yung Chun Lee
, Cheng Hsin Chuang

Department of Mechanical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The melting duration and molten depth are key information for Laser-Assisted Direct Imprinting, which raises the issue of the melting & solidification induced by excimer-pulse-laser shining through unilaterally transparent binary materials. Based on the matured laser-annealing analysis, the thermal-contact resistance is taken into account to simulate and predict the melting behavior for this process. The result in this study indicates the laser-annealing case as well as the perfect-contact case provide the upper-bound and the lower-bound values for the physical quantities involved in this process even without the detail information of the changing of thermal-contact resistance during process.

Original language	English
Title of host publication	2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings
Editors	M. Laudon, B. Romanowicz
Pages	598-601
Number of pages	4
Publication status	Published - 2005
Event	2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 - Anaheim, CA, United States Duration: 2005 May 8 → 2005 May 12

Publication series

Name	2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

Other

Other	2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005
Country/Territory	United States
City	Anaheim, CA
Period	05-05-08 → 05-05-12

All Science Journal Classification (ASJC) codes

General Engineering

Cite this

Hsiao, F. B., Wang, D. B., Jen, C. P., Lee, Y. C., & Chuang, C. H. (2005). Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing. In M. Laudon, & B. Romanowicz (Eds.), 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings (pp. 598-601). (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).

Hsiao, Fei Bin ; Wang, Di Bao ; Jen, Chun Ping et al. / Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing. 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. editor / M. Laudon ; B. Romanowicz. 2005. pp. 598-601 (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).

@inproceedings{29c25900496f4cd08939579b8088700c,

title = "Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing",

abstract = "The melting duration and molten depth are key information for Laser-Assisted Direct Imprinting, which raises the issue of the melting \& solidification induced by excimer-pulse-laser shining through unilaterally transparent binary materials. Based on the matured laser-annealing analysis, the thermal-contact resistance is taken into account to simulate and predict the melting behavior for this process. The result in this study indicates the laser-annealing case as well as the perfect-contact case provide the upper-bound and the lower-bound values for the physical quantities involved in this process even without the detail information of the changing of thermal-contact resistance during process.",

author = "Hsiao, \{Fei Bin\} and Wang, \{Di Bao\} and Jen, \{Chun Ping\} and Lee, \{Yung Chun\} and Chuang, \{Cheng Hsin\}",

year = "2005",

language = "English",

isbn = "0976798522",

series = "2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings",

pages = "598--601",

editor = "M. Laudon and B. Romanowicz",

booktitle = "2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings",

note = "2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 ; Conference date: 08-05-2005 Through 12-05-2005",

}

Hsiao, FB, Wang, DB, Jen, CP, Lee, YC & Chuang, CH 2005, Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing. in M Laudon & B Romanowicz (eds), 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings, pp. 598-601, 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005, Anaheim, CA, United States, 05-05-08.

Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing. / Hsiao, Fei Bin; Wang, Di Bao; Jen, Chun Ping et al.
2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. ed. / M. Laudon; B. Romanowicz. 2005. p. 598-601 (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing

AU - Hsiao, Fei Bin

AU - Wang, Di Bao

AU - Jen, Chun Ping

AU - Lee, Yung Chun

AU - Chuang, Cheng Hsin

PY - 2005

Y1 - 2005

N2 - The melting duration and molten depth are key information for Laser-Assisted Direct Imprinting, which raises the issue of the melting & solidification induced by excimer-pulse-laser shining through unilaterally transparent binary materials. Based on the matured laser-annealing analysis, the thermal-contact resistance is taken into account to simulate and predict the melting behavior for this process. The result in this study indicates the laser-annealing case as well as the perfect-contact case provide the upper-bound and the lower-bound values for the physical quantities involved in this process even without the detail information of the changing of thermal-contact resistance during process.

AB - The melting duration and molten depth are key information for Laser-Assisted Direct Imprinting, which raises the issue of the melting & solidification induced by excimer-pulse-laser shining through unilaterally transparent binary materials. Based on the matured laser-annealing analysis, the thermal-contact resistance is taken into account to simulate and predict the melting behavior for this process. The result in this study indicates the laser-annealing case as well as the perfect-contact case provide the upper-bound and the lower-bound values for the physical quantities involved in this process even without the detail information of the changing of thermal-contact resistance during process.

UR - https://www.scopus.com/pages/publications/32044438270

UR - https://www.scopus.com/pages/publications/32044438270#tab=citedBy

M3 - Conference contribution

AN - SCOPUS:32044438270

SN - 0976798522

T3 - 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

SP - 598

EP - 601

BT - 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

A2 - Laudon, M.

A2 - Romanowicz, B.

T2 - 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005

Y2 - 8 May 2005 through 12 May 2005

ER -

Hsiao FB, Wang DB, Jen CP, Lee YC, Chuang CH. Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing. In Laudon M, Romanowicz B, editors, 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. 2005. p. 598-601. (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).

Numerical investigation of phase-change heat transfer for laser-assisted direct nano imprint processing

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All Science Journal Classification (ASJC) codes

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