Off-plane diffraction of extreme ultraviolet light caused by line width roughness

Wen Yu Chen, Chun Hung Lin

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

A simple and fast method using extreme ultraviolet off-plane scatterometry for in-line line width roughness (LWR) metrology is proposed. The effect of line roughness on diffraction is numerically investigated. LWR diffracts light into the off-plane of the incidence direction, thereby causing a decrement in specular reflection. The amplitude of LWR can be quantified by detecting the decrement of the specular reflection. The angular distribution of m = 0 and n ≠ 0 diffraction orders is related to the LWR spectrum. LWR spectral analysis is possible by scanning the angular distribution of diffracted light. This study can be applied to both amplitude measurement and spectral analysis of LWR for in-line metrology.

Original languageEnglish
Pages (from-to)79-84
Number of pages6
JournalThin Solid Films
Volume522
DOIs
Publication statusPublished - 2012 Nov 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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