On the electrodeposition of arsenic in a choline chloride/ethylene glycol deep eutectic solvent

Po Kai Wang, Yi Ting Hsieh, I. Wen Sun

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

The electrochemical behavior of arsenic(III) is investigated in the ethaline deep eutectic solvent (DES) that is obtained by mixing 1 mol eq. of choline chloride and 2 mol eq. of ethylene glycol using As2O3 as the As(III) source. Cyclic voltammetry and rotating disc voltammetry experiments indicate that the reduction of As(III) to As is a single step three electron transfer process with slow kinetics. Chronoamperometry experiments indicate that the deposition of arsenic at a glassy carbon electrode involves with an overpotential-driven three dimensional instantaneous nucleation/growth process. The calculated number density of the nuclei increases as a function of applied overpotential. Amorphous arsenic coatings are prepared using constant potential, constant current, and pulse potential electrolysis experiments. The morphology of the electrodeposits is examined by SEM.

Original languageEnglish
Pages (from-to)D204-D209
JournalJournal of the Electrochemical Society
Volume164
Issue number4
DOIs
Publication statusPublished - 2017

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

Fingerprint Dive into the research topics of 'On the electrodeposition of arsenic in a choline chloride/ethylene glycol deep eutectic solvent'. Together they form a unique fingerprint.

Cite this