TY - JOUR
T1 - On the hydrogen sensing behaviors of an InAlAs-based schottky diode with a thin Pt catalytic metal
AU - Yen, Chih Hung
AU - Hung, Ching Wen
AU - Chen, Huey Ing
AU - Tsai, Tsung Han
AU - Chen, Tzu Pin
AU - Chen, Li Yang
AU - Chu, Kuei Yi
AU - Liu, Wen Chau
PY - 2008/4/25
Y1 - 2008/4/25
N2 - A hydrogen sensor based on a Pt/In0.52Al0.48As Schottky diode with a thin (50 Å) Pt catalytic metal is studied and presented. Because of the inherent properties of Pt (high work function) and In0.52Al0.48As (large bandgap), the studied device demonstrates considerable benefits including low hydrogen gas detection limit (<14ppm H2/air), high sensitivity (1974% under 9970ppm H 2/air gas), wide operating temperature range (≥ 160°C), fast response time (≤4s), and widespread reverse voltage operating regime (-0.5 to -5 V). In addition, surface morphology and piezoelectric effect play key roles in the hydrogen sensing performance. Compared with similar devices with thicker (100 Å) Pt metal, the studied sensor device exhibits a higher hydrogen detection sensitivity under lower hydrogen concentration (≤1000 ppm H 2/air) environments.
AB - A hydrogen sensor based on a Pt/In0.52Al0.48As Schottky diode with a thin (50 Å) Pt catalytic metal is studied and presented. Because of the inherent properties of Pt (high work function) and In0.52Al0.48As (large bandgap), the studied device demonstrates considerable benefits including low hydrogen gas detection limit (<14ppm H2/air), high sensitivity (1974% under 9970ppm H 2/air gas), wide operating temperature range (≥ 160°C), fast response time (≤4s), and widespread reverse voltage operating regime (-0.5 to -5 V). In addition, surface morphology and piezoelectric effect play key roles in the hydrogen sensing performance. Compared with similar devices with thicker (100 Å) Pt metal, the studied sensor device exhibits a higher hydrogen detection sensitivity under lower hydrogen concentration (≤1000 ppm H 2/air) environments.
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U2 - 10.1143/JJAP.47.2862
DO - 10.1143/JJAP.47.2862
M3 - Article
AN - SCOPUS:54249111443
SN - 0021-4922
VL - 47
SP - 2862
EP - 2864
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 4 PART 2
ER -