Abstract
The shallow defect evolution in Si-implanted and -annealed liquid-encapsulated Czochralski-grown GaAs is investigated by photoluminescence experiments. Three major emission lines are found. The first emission line located at 1.492 eV corresponds to the SiGa-CAs radiative recombination. The remaining two lines located at 1.44 and 1.40 eV are shown to correspond to GaI-SiAs and VAs-SiAs radiative recombinations, respectively. The effects of these three shallow centers on the silicon activation efficiency are discussed with respect to different annealing and implantation conditions.
Original language | English |
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Pages (from-to) | 1246-1252 |
Number of pages | 7 |
Journal | Journal of Applied Physics |
Volume | 65 |
Issue number | 3 |
DOIs | |
Publication status | Published - 1989 |
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)