On the rupture process of thin liquid film

Chi Chuan Hwang, Shang Hwei Chang, Jun Liang Chen

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)


This present work aims at researching the rupture process of thin liquid film of viscous Newtonian fluid on a horizontal plane. First, we use a numerical method to solve the nonlinear evolution equation derived by Williams and Davis. The numerical results reveal that the rupture processes can be divided into two parts; one is the slow weak nonlinear process which almost dominates the whole rupture time, and the other is the rapid strong nonlinear process which just occupies a little rupture time. Second, we use the weak nonlinear theory to solve the nonlinear film equation, and modify this method to match the real process. Eventually, we can obtain the approximation analytical solutions which could predict the nonlinear film rupture time more quickly and correctly.

Original languageEnglish
Pages (from-to)184-188
Number of pages5
JournalJournal of Colloid And Interface Science
Issue number1
Publication statusPublished - 1993 Aug

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Surfaces, Coatings and Films
  • Colloid and Surface Chemistry


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