Optical detection of protrusive defects on a thin-film transistor

Fu Ming Tzu, Jung Shun Chen, Jung Hua Chou

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


Protrusive defects on the color filter of thin-film transistor (TFT) liquid crystal displays (LCDs) frequently damage the valuable photomask. A fast method using side-view illuminations with digital charge-coupled devices (CCDs) that filter out ultraviolet (UV)490 nm was developed to detect the protrusive defects of thin-film type in four substrates of the black matrix (BM), red, green, and blue color filters. Between the photomask and substrate, the depth of field (DOF) is normally 300 µm for the proximity-type aligner; we select the four substrates to evaluate the detectability in the task. The experiment is capable of detecting measurements of 300 µm, and measurements even lower than 100 µm can be assessed successfully. The maximum error of the measurement is within 6% among the four samples. Furthermore, the uncertainty analysis of three standard deviations is conducted. Thus, the method is cost-effective to prevent damage for valuable photomasks in the flat-panel display industry.

Original languageEnglish
Article number440
Issue number12
Publication statusPublished - 2018 Dec

All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Inorganic Chemistry


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