Optical properties of ITO/AlOx thin films prepared by reactive d.c. magnetron sputtering

Su Shia Lin, Jow-Lay Huang

Research output: Contribution to journalArticle

Abstract

ITO/AlOx films were deposited on PMMA by reactive d.c. magnetron sputtering. A transparent AlOx film was selected as a antireflective coating material in this investigation. The feasibility of using AlOx as an antireflective coating material for ITO films, and the influence of oxygen flow rate and bias voltage on the optical properties of AlOx films were studied. A dramatic increase in absorption was observed near a wavelength of 380 nm. The absorption of ITO/AlOx films increased initially with the bias voltage. However when the bias voltage exceed a critical value, the absorption decreased again. There was a close relationship between the content of Al and the IR absorption of ITO/AlOx films. The absorption in the infrared region of ITO/AlOx films increased with the oxygen flow rate and film thickness.

Original languageEnglish
Pages (from-to)771-776
Number of pages6
JournalCeramics International
Volume29
Issue number7
DOIs
Publication statusPublished - 2003 Jan 1

Fingerprint

Reactive sputtering
Magnetron sputtering
Optical properties
Thin films
Bias voltage
Flow rate
Oxygen
Coatings
Polymethyl Methacrylate
Film thickness
Infrared radiation
Wavelength

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

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abstract = "ITO/AlOx films were deposited on PMMA by reactive d.c. magnetron sputtering. A transparent AlOx film was selected as a antireflective coating material in this investigation. The feasibility of using AlOx as an antireflective coating material for ITO films, and the influence of oxygen flow rate and bias voltage on the optical properties of AlOx films were studied. A dramatic increase in absorption was observed near a wavelength of 380 nm. The absorption of ITO/AlOx films increased initially with the bias voltage. However when the bias voltage exceed a critical value, the absorption decreased again. There was a close relationship between the content of Al and the IR absorption of ITO/AlOx films. The absorption in the infrared region of ITO/AlOx films increased with the oxygen flow rate and film thickness.",
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Optical properties of ITO/AlOx thin films prepared by reactive d.c. magnetron sputtering. / Lin, Su Shia; Huang, Jow-Lay.

In: Ceramics International, Vol. 29, No. 7, 01.01.2003, p. 771-776.

Research output: Contribution to journalArticle

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