Optimal Design and Manufacturing Process of Substrate-Free Surface Plasmon Nanolaser

Yu Hsun Chou; Shuo Chen Chen; Wing Sing Cheung

doi:10.1364/CLEO_FS.2023.FM4D.6

Optimal Design and Manufacturing Process of Substrate-Free Surface Plasmon Nanolaser

Yu Hsun Chou, Shuo Chen Chen, Wing Sing Cheung

Department of Photonics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In this study, we calculate the minimum size of SIM-structured nanolasers and propose corresponding fabrication methods to achieve optical mode volumes and physical volumes close to those of LSP-mode nanolasers.

Original language	English
Title of host publication	CLEO
Subtitle of host publication	Fundamental Science, CLEO:FS 2023
Publisher	Optical Society of America
ISBN (Electronic)	9781957171258
DOIs	https://doi.org/10.1364/CLEO_FS.2023.FM4D.6
Publication status	Published - 2023
Event	CLEO: Fundamental Science, CLEO:FS 2023 - Part of Conference on Lasers and Electro-Optics 2023 - San Jose, United States Duration: 2023 May 7 → 2023 May 12

Publication series

Name	CLEO: Fundamental Science, CLEO:FS 2023

Conference

Conference	CLEO: Fundamental Science, CLEO:FS 2023 - Part of Conference on Lasers and Electro-Optics 2023
Country/Territory	United States
City	San Jose
Period	23-05-07 → 23-05-12

All Science Journal Classification (ASJC) codes

Instrumentation
General Computer Science
Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Space and Planetary Science
Control and Systems Engineering
Electrical and Electronic Engineering

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10.1364/CLEO_FS.2023.FM4D.6

Cite this

@inproceedings{b212f990dcdd4da29beb6030be4009ae,

title = "Optimal Design and Manufacturing Process of Substrate-Free Surface Plasmon Nanolaser",

abstract = "In this study, we calculate the minimum size of SIM-structured nanolasers and propose corresponding fabrication methods to achieve optical mode volumes and physical volumes close to those of LSP-mode nanolasers.",

author = "Chou, {Yu Hsun} and Chen, {Shuo Chen} and Cheung, {Wing Sing}",

note = "Publisher Copyright: {\textcopyright} Optica Publishing Group 2023, {\textcopyright} 2023 The Author(s); CLEO: Fundamental Science, CLEO:FS 2023 - Part of Conference on Lasers and Electro-Optics 2023 ; Conference date: 07-05-2023 Through 12-05-2023",

year = "2023",

doi = "10.1364/CLEO_FS.2023.FM4D.6",

language = "English",

series = "CLEO: Fundamental Science, CLEO:FS 2023",

publisher = "Optical Society of America",

booktitle = "CLEO",

}

Chou, YH, Chen, SC & Cheung, WS 2023, Optimal Design and Manufacturing Process of Substrate-Free Surface Plasmon Nanolaser. in CLEO: Fundamental Science, CLEO:FS 2023. CLEO: Fundamental Science, CLEO:FS 2023, Optical Society of America, CLEO: Fundamental Science, CLEO:FS 2023 - Part of Conference on Lasers and Electro-Optics 2023, San Jose, United States, 23-05-07. https://doi.org/10.1364/CLEO_FS.2023.FM4D.6

TY - GEN

T1 - Optimal Design and Manufacturing Process of Substrate-Free Surface Plasmon Nanolaser

AU - Chou, Yu Hsun

AU - Chen, Shuo Chen

AU - Cheung, Wing Sing

PY - 2023

Y1 - 2023

N2 - In this study, we calculate the minimum size of SIM-structured nanolasers and propose corresponding fabrication methods to achieve optical mode volumes and physical volumes close to those of LSP-mode nanolasers.

AB - In this study, we calculate the minimum size of SIM-structured nanolasers and propose corresponding fabrication methods to achieve optical mode volumes and physical volumes close to those of LSP-mode nanolasers.

UR - http://www.scopus.com/inward/record.url?scp=85190965988&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85190965988&partnerID=8YFLogxK

U2 - 10.1364/CLEO_FS.2023.FM4D.6

DO - 10.1364/CLEO_FS.2023.FM4D.6

M3 - Conference contribution

AN - SCOPUS:85190965988

T3 - CLEO: Fundamental Science, CLEO:FS 2023

BT - CLEO

PB - Optical Society of America

T2 - CLEO: Fundamental Science, CLEO:FS 2023 - Part of Conference on Lasers and Electro-Optics 2023

Y2 - 7 May 2023 through 12 May 2023

ER -

Optimal Design and Manufacturing Process of Substrate-Free Surface Plasmon Nanolaser

Abstract

Publication series

Conference

All Science Journal Classification (ASJC) codes

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