Optimal magnetic field path designs for enhanced depositions of DC magnetron sputter

Cheng Tsung Liu, Chang Chou Hwang, Chih-Wen Chang

Research output: Contribution to journalArticle

Abstract

By properly designing the magnetic fields on top of the target surface, more target atoms can be sputtered and smoother depositions onto the substrate surface can be achieved of a dc magnetron sputter (MS). Based on detailed 3-D field information and appropriate emulation process, the argon ion bombardments to the target surface and collisions to those sputtered target atoms can then be thoroughly evaluated. Therefore, from Taguchi's method and feasible structural compositions, the optimization objective of designing adequate refinement parts for dc MS can be conveniently achieved. From the experimental measurements, by both the thickness gauge and atomic force microscopy, the enhanced performances of the existing dc MS systems can then be confirmed.

Original languageEnglish
Article number6971640
JournalIEEE Transactions on Magnetics
Volume50
Issue number11
DOIs
Publication statusPublished - 2014 Nov 1

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Magnetic fields
Thickness gages
Atoms
Taguchi methods
Argon
Ion bombardment
Atomic force microscopy
Substrates
Chemical analysis

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

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Optimal magnetic field path designs for enhanced depositions of DC magnetron sputter. / Liu, Cheng Tsung; Hwang, Chang Chou; Chang, Chih-Wen.

In: IEEE Transactions on Magnetics, Vol. 50, No. 11, 6971640, 01.11.2014.

Research output: Contribution to journalArticle

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