Optimization of the geometry of blockage plates to improve film uniformity in a DC magnetron sputtering machine

Wen Lih Chen, Huann Ming Chou, Chang Ren Chen, Shi Sung Cheng

Research output: Contribution to journalArticle

Abstract

Inserting blockage plates in a sputtering chamber is one of the methods to obtain better film-thickness uniformity on the substrate. Conventional blockage plates are flat, and they achieve moderate improvement on film uniformity but at a cost of seriously compromising the film deposition rate on the substrate. In this study, a numerical method is developed to calculate the optimized geometry of blockage plates. With the optimized plates in place, very high level of film uniformity can be achieved with only moderate reduction on the film deposition rate.

Original languageEnglish
Pages (from-to)575-585
Number of pages11
JournalJournal of the Chinese Society of Mechanical Engineers, Transactions of the Chinese Institute of Engineers, Series C/Chung-Kuo Chi Hsueh Kung Ch'eng Hsuebo Pao
Volume32
Issue number6
Publication statusPublished - 2011 Dec 1

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering

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