Abstract
The hexamethyldisiloxane (HMDSO) film was demonstrated as a bilayer bottom antireflective coating (BARC) layer for KrF and ArF lithographies. The materials of the bilayer can be varied to have suitable optical constants as BARC materials, by adjusting the gas flow rate ratio. The bilayer was also shown to be capable of providing large thickness controlled tolerance.
| Original language | English |
|---|---|
| Pages (from-to) | 3323-3327 |
| Number of pages | 5 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 18 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 2000 Nov |
| Event | 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA Duration: 2000 May 30 → 2000 Jun 2 |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering