Overlay error compensation using advanced process control with dynamically adjusted proportional-integral R2R controller

Chen Fu Chien, Ying Jen Chen, Chia Yu Hsu, Hung Kai Wang

Research output: Contribution to journalArticlepeer-review

33 Citations (Scopus)

Abstract

As semiconductor manufacturing reaching nanotechnology, to obtain high resolution and alignment accuracy via minimizing overlay errors within the tolerance is crucial. To address the needs of changing production and process conditions, this study aims to propose a novel dynamically adjusted proportional-integral (DAPI) run-to-run (R2R) controller to adapt equipment parameters to enhance the overlay control performance. This study evaluates the performance of controllers via the variation of each overlay factor and the variation of maximum overlay errors in real settings. To validate the effectiveness of the proposed approach, an empirical study was conducted in a leading semiconductor company in Taiwan and the results showed practical viability of the proposed DAPI controller to reduce overlay errors effectively than conventional exponentially weighted moving average controller used in this company.

Original languageEnglish
Article number6609079
Pages (from-to)473-484
Number of pages12
JournalIEEE Transactions on Automation Science and Engineering
Volume11
Issue number2
DOIs
Publication statusPublished - 2014 Apr

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Overlay error compensation using advanced process control with dynamically adjusted proportional-integral R2R controller'. Together they form a unique fingerprint.

Cite this