Oxygen-adsorption characterization of activated non-evaporable Ti-Zr-V getter films by synchrotron radiation photoemission spectroscopy

Chien Cheng Li, Jow-Lay Huang, Ran Jin Lin, Ding Fwu Lii, Chia Hao Chen

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

TiZrV films, grown at the deposition angles of 0° and 70°, were used for the study of the oxygen-adsorption process. When the deposition angle is 0°, the appearance of the film is dense columnar structure. However, the film grown at the glancing angle of 70° is composed of porous and isolated columns, which are made of fine clusters. The activated TiZrV films have the capability to absorb oxygen at room temperature. The component Zr is more easily oxidized than Ti and V components when the TiZrV film is exposed in oxygen. The content of oxidized Ti and oxidized V does not linearly increase with the increase of oxygen exposure when there is a metallic Zr component on the surface of the film.

Original languageEnglish
Pages (from-to)378-382
Number of pages5
JournalThin Solid Films
Volume516
Issue number2-4
DOIs
Publication statusPublished - 2007 Dec 3

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Photoelectron spectroscopy
Synchrotron radiation
synchrotron radiation
photoelectric emission
Oxygen
Adsorption
adsorption
oxygen
spectroscopy
room temperature

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Li, Chien Cheng ; Huang, Jow-Lay ; Lin, Ran Jin ; Lii, Ding Fwu ; Chen, Chia Hao. / Oxygen-adsorption characterization of activated non-evaporable Ti-Zr-V getter films by synchrotron radiation photoemission spectroscopy. In: Thin Solid Films. 2007 ; Vol. 516, No. 2-4. pp. 378-382.
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abstract = "TiZrV films, grown at the deposition angles of 0° and 70°, were used for the study of the oxygen-adsorption process. When the deposition angle is 0°, the appearance of the film is dense columnar structure. However, the film grown at the glancing angle of 70° is composed of porous and isolated columns, which are made of fine clusters. The activated TiZrV films have the capability to absorb oxygen at room temperature. The component Zr is more easily oxidized than Ti and V components when the TiZrV film is exposed in oxygen. The content of oxidized Ti and oxidized V does not linearly increase with the increase of oxygen exposure when there is a metallic Zr component on the surface of the film.",
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Oxygen-adsorption characterization of activated non-evaporable Ti-Zr-V getter films by synchrotron radiation photoemission spectroscopy. / Li, Chien Cheng; Huang, Jow-Lay; Lin, Ran Jin; Lii, Ding Fwu; Chen, Chia Hao.

In: Thin Solid Films, Vol. 516, No. 2-4, 03.12.2007, p. 378-382.

Research output: Contribution to journalArticle

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AB - TiZrV films, grown at the deposition angles of 0° and 70°, were used for the study of the oxygen-adsorption process. When the deposition angle is 0°, the appearance of the film is dense columnar structure. However, the film grown at the glancing angle of 70° is composed of porous and isolated columns, which are made of fine clusters. The activated TiZrV films have the capability to absorb oxygen at room temperature. The component Zr is more easily oxidized than Ti and V components when the TiZrV film is exposed in oxygen. The content of oxidized Ti and oxidized V does not linearly increase with the increase of oxygen exposure when there is a metallic Zr component on the surface of the film.

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