Performance characterization of nonevaporable porous Ti getter films

Chien Cheng Li; Jow Lay Huang; Ran Jin Lin; Ding Fwu Lii; Chia Hao Chen

doi:10.1116/1.2757177

Performance characterization of nonevaporable porous Ti getter films

Chien Cheng Li, Jow Lay Huang, Ran Jin Lin, Ding Fwu Lii, Chia Hao Chen

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

The highly porous Ti film getters on (100) silicon substrates have been successfully grown by dc magnetron sputtering with varying glancing angle. The porous films were formed when the glancing angle was higher than 30°. The larger the glancing angle, the higher the porosity and specific surface area of the Ti films. The porous films were composed of isolated columnar crystals, and they have a larger capability to absorb oxygen than dense Ti films do. Differential scanning calorimetry analysis shows that the exothermal reaction temperature for a dense Ti film is 348 °C. However, that for the porous Ti film ranges from 291 to 394 °C. The suitable operation condition of porous Ti film getters can be evaluated using thermal desorption spectroscopy. The reversible and irreversible reactions may occur during gas desorption/adsorption of porous Ti films.

Original language	English
Pages (from-to)	1373-1380
Number of pages	8
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	25
Issue number	5
DOIs	https://doi.org/10.1116/1.2757177
Publication status	Published - 2007

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.2757177

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title = "Performance characterization of nonevaporable porous Ti getter films",

abstract = "The highly porous Ti film getters on (100) silicon substrates have been successfully grown by dc magnetron sputtering with varying glancing angle. The porous films were formed when the glancing angle was higher than 30°. The larger the glancing angle, the higher the porosity and specific surface area of the Ti films. The porous films were composed of isolated columnar crystals, and they have a larger capability to absorb oxygen than dense Ti films do. Differential scanning calorimetry analysis shows that the exothermal reaction temperature for a dense Ti film is 348 °C. However, that for the porous Ti film ranges from 291 to 394 °C. The suitable operation condition of porous Ti film getters can be evaluated using thermal desorption spectroscopy. The reversible and irreversible reactions may occur during gas desorption/adsorption of porous Ti films.",

author = "Li, {Chien Cheng} and Huang, {Jow Lay} and Lin, {Ran Jin} and Lii, {Ding Fwu} and Chen, {Chia Hao}",

note = "Funding Information: The research was financially supported by the National Science Council, Taiwan, R.O.C. under Contract No. NSC 95-2221-E230-008 and NCKU Project of Promoting Academic Excellence and Developing World Class Research Centers under Contract No. D96-2700. The authors would also like to thank the National Synchrotron Radiation Research Center, Hsinchu, Taiwan, R.O.C. for equipment access and technical support. ",

year = "2007",

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AU - Li, Chien Cheng

AU - Huang, Jow Lay

AU - Lin, Ran Jin

AU - Lii, Ding Fwu

AU - Chen, Chia Hao

N1 - Funding Information: The research was financially supported by the National Science Council, Taiwan, R.O.C. under Contract No. NSC 95-2221-E230-008 and NCKU Project of Promoting Academic Excellence and Developing World Class Research Centers under Contract No. D96-2700. The authors would also like to thank the National Synchrotron Radiation Research Center, Hsinchu, Taiwan, R.O.C. for equipment access and technical support.

PY - 2007

Y1 - 2007

N2 - The highly porous Ti film getters on (100) silicon substrates have been successfully grown by dc magnetron sputtering with varying glancing angle. The porous films were formed when the glancing angle was higher than 30°. The larger the glancing angle, the higher the porosity and specific surface area of the Ti films. The porous films were composed of isolated columnar crystals, and they have a larger capability to absorb oxygen than dense Ti films do. Differential scanning calorimetry analysis shows that the exothermal reaction temperature for a dense Ti film is 348 °C. However, that for the porous Ti film ranges from 291 to 394 °C. The suitable operation condition of porous Ti film getters can be evaluated using thermal desorption spectroscopy. The reversible and irreversible reactions may occur during gas desorption/adsorption of porous Ti films.

AB - The highly porous Ti film getters on (100) silicon substrates have been successfully grown by dc magnetron sputtering with varying glancing angle. The porous films were formed when the glancing angle was higher than 30°. The larger the glancing angle, the higher the porosity and specific surface area of the Ti films. The porous films were composed of isolated columnar crystals, and they have a larger capability to absorb oxygen than dense Ti films do. Differential scanning calorimetry analysis shows that the exothermal reaction temperature for a dense Ti film is 348 °C. However, that for the porous Ti film ranges from 291 to 394 °C. The suitable operation condition of porous Ti film getters can be evaluated using thermal desorption spectroscopy. The reversible and irreversible reactions may occur during gas desorption/adsorption of porous Ti films.

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Performance characterization of nonevaporable porous Ti getter films

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