Performance improved mechanisms of chlorine-treated AlGaN/GaN MOS-HEMTs with ZnO gate dielectric layer

Ching Ting Lee, Ya Lan Chiou

Research output: Contribution to journalArticlepeer-review

Abstract

The intrinsic ZnO (i-ZnO) film deposited by a vapor cooling condensation system was used as the gate dielectric layer of the AlGaN/GaN metal-oxide-semiconductor high-electron-mobility transistors (MOS-HEMTs). To reduce the surface states, the chlorine surface treatment was utilized to obtain a high quality i-ZnO/AlGaN interface. The resulting saturation drain-source current and the maximum extrinsic transconductance were 0.85 A/mm and 207 mS/mm, respectively. Comparing to the untreated AlGaN/GaN MOS-HEMTs, the chlorine-treated MOS-HEMTs revealed better direct-current output performances and pulsed output performances. The improved performances of the chlorine-treated MOS-HEMTs were attributed to the reduction of Ga dangling bonds and the passivation of N vacancies resided on the AlGaN surface by using the chlorine surface treatment.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume158
Issue number8
DOIs
Publication statusPublished - 2011 Aug 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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