Performance improvement of microcrystalline p-SiC/i-Si/n-Si thin film solar cells by using laser-assisted plasma enhanced chemical vapor deposition

Hsin Ying Lee, Ting Chun Wang, Chun Yen Tseng

Research output: Contribution to journalArticlepeer-review

Abstract

The microcrystalline p-SiC/i-Si/n-Si thin film solar cells treated with hydrogen plasma were fabricated at low temperature using a CO2 laser-assisted plasma enhanced chemical vapor deposition (LAPECVD) system. According to the micro-Raman results, the i-Si films shifted from 482 cm -1 to 512 cm-1 as the assisting laser power increased from 0 W to 80 W, which indicated a gradual transformation from amorphous to crystalline Si. From X-ray diffraction (XRD) results, the microcrystalline i-Si films with (111), (220), and (311) diffraction were obtained. Compared with the Si-based thin film solar cells deposited without laser assistance, the short-circuit current density and the power conversion efficiency of the solar cells with assisting laser power of 80 W were improved from 14.38 mA/cm 2 to 18.16 mA/cm2 and from 6.89% to 8.58%, respectively.

Original languageEnglish
Article number795152
JournalInternational Journal of Photoenergy
Volume2014
DOIs
Publication statusPublished - 2014

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Atomic and Molecular Physics, and Optics
  • Renewable Energy, Sustainability and the Environment
  • Materials Science(all)

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