Performance improvement of Y-doped VOx microbolometers with nanomesh antireflection layer

Tsung Han Yeh, Cheng Kang Tsai, Shao Yu Chu, Hsin Ying Lee, Ching Ting Lee

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

In the study, the yttrium (Y)-doped vanadium oxide (VOx:Y) films used as the sensitive layers of microbolometers were deposited using a radio frequency magnetron cosputtering system. The temperature coefficient of resistance (TCR) of the VOx:Y films was enhanced from 1.88%/°C to 2.85%/°C in comparison with that of the VOx films. To further improve the performance of microbolometers, the nanomesh antireflection layer was placed on the top surface of the microbolometers to reduce the infrared reflection. The responsivity, thermal time constant, thermal conductivity, absorptance, and detectivity of the VOx:Y microbolometers with nanomesh antireflection layer were 931.89-48 kV/W, 4.48 ms, 6.19-108 W/K, 74.41% and 2.20-108 cmHz0.5W1, respectively.

Original languageEnglish
Pages (from-to)6433-6442
Number of pages10
JournalOptics Express
Volume28
Issue number5
DOIs
Publication statusPublished - 2020 Mar 2

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

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