Perspective on the development of microplasma technology: The role of oxygen in downstream microwave plasma

Y. T. Wu, Jiunn-Der Liao, C. C. Weng, M. C. Wang, Juu-En Chang, C. H. Chen, M. Zharnikov

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

We studied the role of a minor fraction of oxygen in nitrogen and argon downstream microwave plasma in view of plasma-processing of ultrathin organic films - self-assembled monolayers (SAMs). As test systems we used SAMs of alkanethiolates on gold substrate. The plasma-induced processes in the films, including their chemical modification, oxidation, and partial decomposition, were monitored in detail. These processes could be directly correlated with the presence of reactive, oxygen-derived species in the plasma. The major plasma-induced processes could be well described by the first order kinetics; the respective reaction rates were also derived.

Original languageEnglish
Pages (from-to)89-95
Number of pages7
JournalContributions to Plasma Physics
Volume47
Issue number1-2
DOIs
Publication statusPublished - 2007 Mar 16

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

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