TY - JOUR
T1 - Perspective on the development of microplasma technology
T2 - The role of oxygen in downstream microwave plasma
AU - Wu, Y. T.
AU - Liao, J. D.
AU - Weng, C. C.
AU - Wang, M. C.
AU - Chang, J. E.
AU - Chen, C. H.
AU - Zharnikov, M.
PY - 2007
Y1 - 2007
N2 - We studied the role of a minor fraction of oxygen in nitrogen and argon downstream microwave plasma in view of plasma-processing of ultrathin organic films - self-assembled monolayers (SAMs). As test systems we used SAMs of alkanethiolates on gold substrate. The plasma-induced processes in the films, including their chemical modification, oxidation, and partial decomposition, were monitored in detail. These processes could be directly correlated with the presence of reactive, oxygen-derived species in the plasma. The major plasma-induced processes could be well described by the first order kinetics; the respective reaction rates were also derived.
AB - We studied the role of a minor fraction of oxygen in nitrogen and argon downstream microwave plasma in view of plasma-processing of ultrathin organic films - self-assembled monolayers (SAMs). As test systems we used SAMs of alkanethiolates on gold substrate. The plasma-induced processes in the films, including their chemical modification, oxidation, and partial decomposition, were monitored in detail. These processes could be directly correlated with the presence of reactive, oxygen-derived species in the plasma. The major plasma-induced processes could be well described by the first order kinetics; the respective reaction rates were also derived.
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U2 - 10.1002/ctpp.200710013
DO - 10.1002/ctpp.200710013
M3 - Article
AN - SCOPUS:33947178330
SN - 0863-1042
VL - 47
SP - 89
EP - 95
JO - Contributions to Plasma Physics
JF - Contributions to Plasma Physics
IS - 1-2
ER -