Photo-resist stripping process using atmospheric micro-plasma system

H. H. Chen, C. C. Weng, Jiunn-Der Liao, K. M. Chen, B. W. Hsu

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10 Citations (Scopus)

Abstract

A capillary electrode based micro-plasma system was utilized to evaluate the photo-resist stripping effect. Argon and nitrogen micro-plasmas were, respectively, employed as the working gas and ignited under atmospheric pressure. The result showed that the latter system required a much higher breakdown voltage than the former one to keep the micro-plasma in a steady state. Nitrogen micro-plasma with the inclusion of atmospheric oxygen was relatively rich in N, O-containing varieties, which thereafter induced complex reactions, e.g. by forming C-N,O structures, with the chemical substances on the photo-resist surface and required extensive treatment time to complete the photo-resist stripping process. In contrast, the use of atmospheric argon micro-plasma was very successful in increasing the photo-resist stripping rate. It is presumable that for this particular process, a simple physical effect with reduced reaction steps is highly proficient in removing photo-resist molecules from the substrate. One may therefore adjust the composition of atmospheric micro-plasma for an effective treatment on a coating.

Original languageEnglish
Article number135201
JournalJournal of Physics D: Applied Physics
Volume42
Issue number13
DOIs
Publication statusPublished - 2009 Sep 21

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

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