Photocatalytic and photoelectrochemical performance of Ta3N5 microcolumn films fabricated using facile reactive sputtering

Der Hwa Lin, Kao Shuo Chang

Research output: Contribution to journalArticle

6 Citations (Scopus)


This paper presents the photocatalytic and photoelectrochemical (PEC) properties of Ta3N5 microcolumn films. The highlights include (1) overcoming the fundamental barrier of standard reactive sputtering for fabricating microcolumns; (2) preventing unnecessary complexity from complicating facile sputtering; (3) an alternative but effective approach for fabricating Ta3N5 without using caustic NH3 gases; (4) investigating morphology tuning for favorable photocatalysis and PEC reactions; and (5) elucidating the relationships of the structures, morphologies, and properties of Ta3N5 microcolumns. High-resolution transmission electron microscopy and selective-area electron diffraction verified the polycrystallinity of Ta3N5 microcolumns, of which the elemental compositions and stoichiometry were measured using electron-probe energy dispersive spectroscopy, Auger electron spectroscopy, and X-ray photoelectron spectroscopy. The corresponding band gap was determined to be approximately 2.1 eV. The sample exhibited a superior photodegradation capability; the photodegradation rate constant k was determined to be approximately 1.4 times higher than that of P25 under UV irradiation. A photocatalytic and PEC cycling test indicated the photodegradation reusability and photostability of the Ta3N5 microcolumns. The incident photon-to-current efficiency performance reached 6%, suggesting that these microcolumns hold potential for application in PEC devices.

Original languageEnglish
Article number075303
JournalJournal of Applied Physics
Issue number7
Publication statusPublished - 2016 Aug 21

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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