Photocatalytic and photoelectrochemical performance of Ta3N5 microcolumn films fabricated using facile reactive sputtering

Der Hwa Lin, Kao Shuo Chang

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

This paper presents the photocatalytic and photoelectrochemical (PEC) properties of Ta3N5 microcolumn films. The highlights include (1) overcoming the fundamental barrier of standard reactive sputtering for fabricating microcolumns; (2) preventing unnecessary complexity from complicating facile sputtering; (3) an alternative but effective approach for fabricating Ta3N5 without using caustic NH3 gases; (4) investigating morphology tuning for favorable photocatalysis and PEC reactions; and (5) elucidating the relationships of the structures, morphologies, and properties of Ta3N5 microcolumns. High-resolution transmission electron microscopy and selective-area electron diffraction verified the polycrystallinity of Ta3N5 microcolumns, of which the elemental compositions and stoichiometry were measured using electron-probe energy dispersive spectroscopy, Auger electron spectroscopy, and X-ray photoelectron spectroscopy. The corresponding band gap was determined to be approximately 2.1 eV. The sample exhibited a superior photodegradation capability; the photodegradation rate constant k was determined to be approximately 1.4 times higher than that of P25 under UV irradiation. A photocatalytic and PEC cycling test indicated the photodegradation reusability and photostability of the Ta3N5 microcolumns. The incident photon-to-current efficiency performance reached 6%, suggesting that these microcolumns hold potential for application in PEC devices.

Original languageEnglish
Article number075303
JournalJournal of Applied Physics
Volume120
Issue number7
DOIs
Publication statusPublished - 2016 Aug 21

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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