Photocurable positive photoresist-comprising copolymers having pendant alkoxy ethyl moieties

Jui-Hsiang Liu, Jen Chieh Shih

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

A series of copolymers based on methacrylic acid (MAA), methyl methacrylate (MMA), n-butyl methacrylate (BM), and bornyl methacrylate (BMA) with various feed molar ratios were synthesized. To introduce the protecting alkoxy ethyl moieties onto copolymers, the pendant carboxyl groups were further reacted with alkyl vinyl ether. The pendant alkoxy ethyl groups on copolymers could be deprotected by acid catalyst. Characterization of positive-tone photoresist-comprising copolymers having pendant alkoxy ethyl groups was carried out. Effects of alicyclic bornyl groups on the sensitivity and thermal properties of copolymers were investigated. It was found that the existence of bornyl groups in polymer might interfere with the hydrogen bonding produced by pendant carboxyl groups, leading to the decrease of thermal resistance. Acid-catalyzed dehydration crosslinking of pendant carboxyl groups of copolymers was also investigated. The exposure characteristic curves and the lithographic evaluation of the positive-tone photoresist were all investigated. Effects of alicyclic bornyl groups on the plasma etching resist of copolymers were also evaluated.

Original languageEnglish
Pages (from-to)889-897
Number of pages9
JournalJournal of Applied Polymer Science
Volume83
Issue number4
DOIs
Publication statusPublished - 2002 Jan 24

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Photoresists
Copolymers
Methacrylates
Acids
Plasma etching
alkoxyl radical
Dehydration
Heat resistance
Crosslinking
Ethers
Hydrogen bonds
Polymers
Thermodynamic properties
Catalysts

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Surfaces, Coatings and Films
  • Polymers and Plastics
  • Materials Chemistry

Cite this

@article{da0c20004b954a34a4435402ea95e543,
title = "Photocurable positive photoresist-comprising copolymers having pendant alkoxy ethyl moieties",
abstract = "A series of copolymers based on methacrylic acid (MAA), methyl methacrylate (MMA), n-butyl methacrylate (BM), and bornyl methacrylate (BMA) with various feed molar ratios were synthesized. To introduce the protecting alkoxy ethyl moieties onto copolymers, the pendant carboxyl groups were further reacted with alkyl vinyl ether. The pendant alkoxy ethyl groups on copolymers could be deprotected by acid catalyst. Characterization of positive-tone photoresist-comprising copolymers having pendant alkoxy ethyl groups was carried out. Effects of alicyclic bornyl groups on the sensitivity and thermal properties of copolymers were investigated. It was found that the existence of bornyl groups in polymer might interfere with the hydrogen bonding produced by pendant carboxyl groups, leading to the decrease of thermal resistance. Acid-catalyzed dehydration crosslinking of pendant carboxyl groups of copolymers was also investigated. The exposure characteristic curves and the lithographic evaluation of the positive-tone photoresist were all investigated. Effects of alicyclic bornyl groups on the plasma etching resist of copolymers were also evaluated.",
author = "Jui-Hsiang Liu and Shih, {Jen Chieh}",
year = "2002",
month = "1",
day = "24",
doi = "10.1002/app.10105",
language = "English",
volume = "83",
pages = "889--897",
journal = "Journal of Applied Polymer Science",
issn = "0021-8995",
publisher = "John Wiley and Sons Inc.",
number = "4",

}

Photocurable positive photoresist-comprising copolymers having pendant alkoxy ethyl moieties. / Liu, Jui-Hsiang; Shih, Jen Chieh.

In: Journal of Applied Polymer Science, Vol. 83, No. 4, 24.01.2002, p. 889-897.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Photocurable positive photoresist-comprising copolymers having pendant alkoxy ethyl moieties

AU - Liu, Jui-Hsiang

AU - Shih, Jen Chieh

PY - 2002/1/24

Y1 - 2002/1/24

N2 - A series of copolymers based on methacrylic acid (MAA), methyl methacrylate (MMA), n-butyl methacrylate (BM), and bornyl methacrylate (BMA) with various feed molar ratios were synthesized. To introduce the protecting alkoxy ethyl moieties onto copolymers, the pendant carboxyl groups were further reacted with alkyl vinyl ether. The pendant alkoxy ethyl groups on copolymers could be deprotected by acid catalyst. Characterization of positive-tone photoresist-comprising copolymers having pendant alkoxy ethyl groups was carried out. Effects of alicyclic bornyl groups on the sensitivity and thermal properties of copolymers were investigated. It was found that the existence of bornyl groups in polymer might interfere with the hydrogen bonding produced by pendant carboxyl groups, leading to the decrease of thermal resistance. Acid-catalyzed dehydration crosslinking of pendant carboxyl groups of copolymers was also investigated. The exposure characteristic curves and the lithographic evaluation of the positive-tone photoresist were all investigated. Effects of alicyclic bornyl groups on the plasma etching resist of copolymers were also evaluated.

AB - A series of copolymers based on methacrylic acid (MAA), methyl methacrylate (MMA), n-butyl methacrylate (BM), and bornyl methacrylate (BMA) with various feed molar ratios were synthesized. To introduce the protecting alkoxy ethyl moieties onto copolymers, the pendant carboxyl groups were further reacted with alkyl vinyl ether. The pendant alkoxy ethyl groups on copolymers could be deprotected by acid catalyst. Characterization of positive-tone photoresist-comprising copolymers having pendant alkoxy ethyl groups was carried out. Effects of alicyclic bornyl groups on the sensitivity and thermal properties of copolymers were investigated. It was found that the existence of bornyl groups in polymer might interfere with the hydrogen bonding produced by pendant carboxyl groups, leading to the decrease of thermal resistance. Acid-catalyzed dehydration crosslinking of pendant carboxyl groups of copolymers was also investigated. The exposure characteristic curves and the lithographic evaluation of the positive-tone photoresist were all investigated. Effects of alicyclic bornyl groups on the plasma etching resist of copolymers were also evaluated.

UR - http://www.scopus.com/inward/record.url?scp=0035941582&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035941582&partnerID=8YFLogxK

U2 - 10.1002/app.10105

DO - 10.1002/app.10105

M3 - Article

VL - 83

SP - 889

EP - 897

JO - Journal of Applied Polymer Science

JF - Journal of Applied Polymer Science

SN - 0021-8995

IS - 4

ER -