Photoluminescence characterization of β-FeSi2 prepared by ion beam sputter deposition (IBSD) method

A. Zhuravlev, H. Yamamoto, K. Shimura, K. Yamaguchi, S. Shamoto, K. Hojou, T. Terai

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2 Citations (Scopus)

Abstract

Photoluminescence (PL) measurement technique was found to be effective in revealing the unique characteristics of β-FeSi2 film formation on Si substrates by means of ion beam sputter deposition (IBSD) method. A strong photoluminescence peak at around 0.8 eV was observed for β-FeSi2 samples and also for Si substrates that were sputter etched by Ne+, and then thermally annealed in air at elevated temperature. Comparison with literature data indicated that the PL peak at 0.8 eV observed in this study was mainly from D1 emission bands in Si substrate, whose intensity was enhanced by the sputter etching and the subsequent annealing of the substrate. Furthermore, comparison between CZ-Si and FZ-Si results indicated that the energy of 0.8 eV peak observed in this study was affected by the presence of oxygen in the Si bulk as well.

Original languageEnglish
Pages (from-to)8149-8153
Number of pages5
JournalThin Solid Films
Volume515
Issue number22
DOIs
Publication statusPublished - 2007 Aug 15

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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