Abstract
本發明為一種光罩的製造方法。步驟包括：提供一基板。於基板上形成複數個微結構，其中各該微結構為一漸縮柱狀結構或一漸縮錐狀結構。提供一液態遮光溶液。於基板上旋轉塗佈、霧化噴塗或澆鑄液態遮光溶液，使基板上形成遮光層。固化該遮光層。
| Original language | English |
|---|---|
| Patent number | I559074 |
| Publication status | Published - 2016 Mar 16 |
Cite this
Lee, Y-C. (2016). PHOTOMASK AND METHOD FOR MANUFACTURING PHOTOMASK. (Patent No. I559074).
@misc{b8b8c94fc0094263a63066fc63a4b9ec,
title = "PHOTOMASK AND METHOD FOR MANUFACTURING PHOTOMASK",
abstract = "本發明為一種光罩的製造方法。步驟包括：提供一基板。於基板上形成複數個微結構，其中各該微結構為一漸縮柱狀結構或一漸縮錐狀結構。提供一液態遮光溶液。於基板上旋轉塗佈、霧化噴塗或澆鑄液態遮光溶液，使基板上形成遮光層。固化該遮光層。",
author = "Yung-Chun Lee",
year = "2016",
month = "3",
day = "16",
language = "English",
type = "Patent",
note = "I559074",
}
Lee, Y-C 2016, PHOTOMASK AND METHOD FOR MANUFACTURING PHOTOMASK, Patent No. I559074.
PHOTOMASK AND METHOD FOR MANUFACTURING PHOTOMASK. / Lee, Yung-Chun (Inventor).
Patent No.: I559074.Research output: Patent
TY - PAT
T1 - PHOTOMASK AND METHOD FOR MANUFACTURING PHOTOMASK
AU - Lee, Yung-Chun
PY - 2016/3/16
Y1 - 2016/3/16
N2 - 本發明為一種光罩的製造方法。步驟包括：提供一基板。於基板上形成複數個微結構，其中各該微結構為一漸縮柱狀結構或一漸縮錐狀結構。提供一液態遮光溶液。於基板上旋轉塗佈、霧化噴塗或澆鑄液態遮光溶液，使基板上形成遮光層。固化該遮光層。
AB - 本發明為一種光罩的製造方法。步驟包括：提供一基板。於基板上形成複數個微結構，其中各該微結構為一漸縮柱狀結構或一漸縮錐狀結構。提供一液態遮光溶液。於基板上旋轉塗佈、霧化噴塗或澆鑄液態遮光溶液，使基板上形成遮光層。固化該遮光層。
M3 - Patent
M1 - I559074
ER -
Lee Y-C, inventor. PHOTOMASK AND METHOD FOR MANUFACTURING PHOTOMASK. I559074. 2016 Mar 16.