PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK

Yung-Chun Lee (Inventor)

Research output: Patent

Abstract

一種光罩的製造方法,其步驟包括:提供可撓性基板。於可撓性基板上形成複數個微結構。於可撓性基板上塗佈遮光材料,使基板形成遮光層。固化遮光層,且遮光層為單一層體。
Translated title of the contribution光罩及光罩的製造方法
Original languageEnglish
Patent numberI592741
Publication statusPublished - 2016 Jan 1

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