PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK

Yung-Chun Lee (Inventor)

Research output: Patent

Abstract

一種光罩的製造方法,其步驟包括:提供可撓性基板。於可撓性基板上形成複數個微結構。於可撓性基板上塗佈遮光材料,使基板形成遮光層。固化遮光層,且遮光層為單一層體。
Original languageEnglish
Patent numberI592741
Publication statusPublished - 2016 Jan 1

Cite this

@misc{8457470a7f9e4d81bb4ab2a29f4b9983,
title = "PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK",
abstract = "一種光罩的製造方法,其步驟包括:提供可撓性基板。於可撓性基板上形成複數個微結構。於可撓性基板上塗佈遮光材料,使基板形成遮光層。固化遮光層,且遮光層為單一層體。",
author = "Yung-Chun Lee",
year = "2016",
month = "1",
day = "1",
language = "English",
type = "Patent",
note = "I592741",

}

TY - PAT

T1 - PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK

AU - Lee, Yung-Chun

PY - 2016/1/1

Y1 - 2016/1/1

N2 - 一種光罩的製造方法,其步驟包括:提供可撓性基板。於可撓性基板上形成複數個微結構。於可撓性基板上塗佈遮光材料,使基板形成遮光層。固化遮光層,且遮光層為單一層體。

AB - 一種光罩的製造方法,其步驟包括:提供可撓性基板。於可撓性基板上形成複數個微結構。於可撓性基板上塗佈遮光材料,使基板形成遮光層。固化遮光層,且遮光層為單一層體。

M3 - Patent

M1 - I592741

ER -