Abstract
一種光罩的製造方法，其步驟包括：提供可撓性基板。於可撓性基板上形成複數個微結構。於可撓性基板上塗佈遮光材料，使基板形成遮光層。固化遮光層，且遮光層為單一層體。
| Original language | English |
|---|---|
| Patent number | I592741 |
| Publication status | Published - 2016 Jan 1 |
Cite this
Lee, Y-C. (2016). PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK. (Patent No. I592741).
@misc{8457470a7f9e4d81bb4ab2a29f4b9983,
title = "PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK",
abstract = "一種光罩的製造方法，其步驟包括：提供可撓性基板。於可撓性基板上形成複數個微結構。於可撓性基板上塗佈遮光材料，使基板形成遮光層。固化遮光層，且遮光層為單一層體。",
author = "Yung-Chun Lee",
year = "2016",
month = "1",
day = "1",
language = "English",
type = "Patent",
note = "I592741",
}
Lee, Y-C 2016, PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK, Patent No. I592741.
PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK. / Lee, Yung-Chun (Inventor).
Patent No.: I592741.Research output: Patent
TY - PAT
T1 - PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK
AU - Lee, Yung-Chun
PY - 2016/1/1
Y1 - 2016/1/1
N2 - 一種光罩的製造方法，其步驟包括：提供可撓性基板。於可撓性基板上形成複數個微結構。於可撓性基板上塗佈遮光材料，使基板形成遮光層。固化遮光層，且遮光層為單一層體。
AB - 一種光罩的製造方法，其步驟包括：提供可撓性基板。於可撓性基板上形成複數個微結構。於可撓性基板上塗佈遮光材料，使基板形成遮光層。固化遮光層，且遮光層為單一層體。
M3 - Patent
M1 - I592741
ER -
Lee Y-C, inventor. PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK. I592741. 2016 Jan 1.