PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK

Yung-Chun Lee (Inventor)

Research output: Patent

Abstract

The present invention comprising the steps of: providing a flexible substrate; Forming a plurality of micro structure on a flexible substrate; Comprising the steps of coating the primary slag on the flexible substrate, the flexible substrate to form a light-shielding layer; And the light shielding layer The light-shielding layer including the step, and curing is a method for producing a photomask in a single layer.
Translated title of the contribution光罩及光罩的製造方法
Original languageEnglish
Patent number10-1655035
Publication statusPublished - 1800

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