PHOTOMASK AND METHOD OF MANUFACTURING PHOTOMASK

Yung-Chun Lee (Inventor)

Research output: Patent

Abstract

[0001] This Non-provisional application claims priority under 35 U.S.C. §119(a) on Patent Application No(s). 103122469 filed in Taiwan, Republic of China on June 30, 2014, the entire contents of which are hereby incorporated by reference.
Translated title of the contribution光罩及光罩的製造方法
Original languageEnglish
Patent number9690188
Publication statusPublished - 2015 Dec 31

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