Photon-exposure-dependent photon-stimulated desorption for obtaining photolysis cross section of molecules adsorbed on surface by monochromatic soft x-ray photons

L. C. Chou, C. Y. Jang, Y. H. Wu, W. C. Tsai, S. K. Wang, J. Chen, S. C. Chang, C. C. Liu, Y. Shai, C. R. Wen

Research output: Contribution to journalArticle

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Abstract

Photon-exposure-dependent positive- and negative-ion photon-stimulated desorption (PSD) was proposed to study the photoreactions and obtain the photolysis cross sections of molecules adsorbed on a single-crystal surface by monochromatic soft x-ray photons with energy near the core level of adsorbate. The changes in the F+ and F- PSD ion yields were measured from CF3Cl molecules adsorbed on Si (111) -7×7 at 30 K (CF 3Cl dose=0.3× 1015 molecules cm2, ∼0.75 monolayer) during irradiation of monochromatic soft x-ray photons near the F (1s) edge. The PSD ion yield data show the following characteristics: (a) The dissociation of adsorbed CF3Cl molecules is due to a combination of direct photodissociation via excitation of F (1s) core level and substrate-mediated dissociation [dissociative attachment and dipolar dissociation induced by the photoelectrons emitting from the silicon substrate]. (b) the F+ ion desorption is associated with the bond breaking of the surface CF3Cl, C F2 Cl, CFCl, and SiF species. (c) the F- yield is mainly due to DA and DD of the adsorbed CF3Cl molecules. (d) The surface SiF is formed by reaction of the surface Si atom with the neutral fluorine atom, F+, or F- ion produced by scission of C-F bond of CF3Cl, C F2 Cl, or CFCl species. A kinetic model was proposed for the explanation of the photolysis of this submonolayer CF3Cl -covered surface. Based on this model and the variation rates of the F+ F- signals during fixed-energy monochromatic photon bombardment at 690.2 and 692.6 eV [near the F (1s) edge], the photolysis cross section was deduced as a function of energy.

Original languageEnglish
Article number214104
JournalJournal of Chemical Physics
Volume129
Issue number21
DOIs
Publication statusPublished - 2008 Dec 12

Fingerprint

Photolysis
photolysis
Desorption
Photons
desorption
X rays
Molecules
cross sections
photons
molecules
Ions
x rays
Core levels
dissociation
ions
Photodissociation
Single crystal surfaces
Atoms
Fluorine
Silicon

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

Cite this

@article{f609c100f959400ba1ec671a637735cb,
title = "Photon-exposure-dependent photon-stimulated desorption for obtaining photolysis cross section of molecules adsorbed on surface by monochromatic soft x-ray photons",
abstract = "Photon-exposure-dependent positive- and negative-ion photon-stimulated desorption (PSD) was proposed to study the photoreactions and obtain the photolysis cross sections of molecules adsorbed on a single-crystal surface by monochromatic soft x-ray photons with energy near the core level of adsorbate. The changes in the F+ and F- PSD ion yields were measured from CF3Cl molecules adsorbed on Si (111) -7×7 at 30 K (CF 3Cl dose=0.3× 1015 molecules cm2, ∼0.75 monolayer) during irradiation of monochromatic soft x-ray photons near the F (1s) edge. The PSD ion yield data show the following characteristics: (a) The dissociation of adsorbed CF3Cl molecules is due to a combination of direct photodissociation via excitation of F (1s) core level and substrate-mediated dissociation [dissociative attachment and dipolar dissociation induced by the photoelectrons emitting from the silicon substrate]. (b) the F+ ion desorption is associated with the bond breaking of the surface CF3Cl, C F2 Cl, CFCl, and SiF species. (c) the F- yield is mainly due to DA and DD of the adsorbed CF3Cl molecules. (d) The surface SiF is formed by reaction of the surface Si atom with the neutral fluorine atom, F+, or F- ion produced by scission of C-F bond of CF3Cl, C F2 Cl, or CFCl species. A kinetic model was proposed for the explanation of the photolysis of this submonolayer CF3Cl -covered surface. Based on this model and the variation rates of the F+ F- signals during fixed-energy monochromatic photon bombardment at 690.2 and 692.6 eV [near the F (1s) edge], the photolysis cross section was deduced as a function of energy.",
author = "Chou, {L. C.} and Jang, {C. Y.} and Wu, {Y. H.} and Tsai, {W. C.} and Wang, {S. K.} and J. Chen and Chang, {S. C.} and Liu, {C. C.} and Y. Shai and Wen, {C. R.}",
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language = "English",
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journal = "Journal of Chemical Physics",
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}

Photon-exposure-dependent photon-stimulated desorption for obtaining photolysis cross section of molecules adsorbed on surface by monochromatic soft x-ray photons. / Chou, L. C.; Jang, C. Y.; Wu, Y. H.; Tsai, W. C.; Wang, S. K.; Chen, J.; Chang, S. C.; Liu, C. C.; Shai, Y.; Wen, C. R.

In: Journal of Chemical Physics, Vol. 129, No. 21, 214104, 12.12.2008.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Photon-exposure-dependent photon-stimulated desorption for obtaining photolysis cross section of molecules adsorbed on surface by monochromatic soft x-ray photons

AU - Chou, L. C.

AU - Jang, C. Y.

AU - Wu, Y. H.

AU - Tsai, W. C.

AU - Wang, S. K.

AU - Chen, J.

AU - Chang, S. C.

AU - Liu, C. C.

AU - Shai, Y.

AU - Wen, C. R.

PY - 2008/12/12

Y1 - 2008/12/12

N2 - Photon-exposure-dependent positive- and negative-ion photon-stimulated desorption (PSD) was proposed to study the photoreactions and obtain the photolysis cross sections of molecules adsorbed on a single-crystal surface by monochromatic soft x-ray photons with energy near the core level of adsorbate. The changes in the F+ and F- PSD ion yields were measured from CF3Cl molecules adsorbed on Si (111) -7×7 at 30 K (CF 3Cl dose=0.3× 1015 molecules cm2, ∼0.75 monolayer) during irradiation of monochromatic soft x-ray photons near the F (1s) edge. The PSD ion yield data show the following characteristics: (a) The dissociation of adsorbed CF3Cl molecules is due to a combination of direct photodissociation via excitation of F (1s) core level and substrate-mediated dissociation [dissociative attachment and dipolar dissociation induced by the photoelectrons emitting from the silicon substrate]. (b) the F+ ion desorption is associated with the bond breaking of the surface CF3Cl, C F2 Cl, CFCl, and SiF species. (c) the F- yield is mainly due to DA and DD of the adsorbed CF3Cl molecules. (d) The surface SiF is formed by reaction of the surface Si atom with the neutral fluorine atom, F+, or F- ion produced by scission of C-F bond of CF3Cl, C F2 Cl, or CFCl species. A kinetic model was proposed for the explanation of the photolysis of this submonolayer CF3Cl -covered surface. Based on this model and the variation rates of the F+ F- signals during fixed-energy monochromatic photon bombardment at 690.2 and 692.6 eV [near the F (1s) edge], the photolysis cross section was deduced as a function of energy.

AB - Photon-exposure-dependent positive- and negative-ion photon-stimulated desorption (PSD) was proposed to study the photoreactions and obtain the photolysis cross sections of molecules adsorbed on a single-crystal surface by monochromatic soft x-ray photons with energy near the core level of adsorbate. The changes in the F+ and F- PSD ion yields were measured from CF3Cl molecules adsorbed on Si (111) -7×7 at 30 K (CF 3Cl dose=0.3× 1015 molecules cm2, ∼0.75 monolayer) during irradiation of monochromatic soft x-ray photons near the F (1s) edge. The PSD ion yield data show the following characteristics: (a) The dissociation of adsorbed CF3Cl molecules is due to a combination of direct photodissociation via excitation of F (1s) core level and substrate-mediated dissociation [dissociative attachment and dipolar dissociation induced by the photoelectrons emitting from the silicon substrate]. (b) the F+ ion desorption is associated with the bond breaking of the surface CF3Cl, C F2 Cl, CFCl, and SiF species. (c) the F- yield is mainly due to DA and DD of the adsorbed CF3Cl molecules. (d) The surface SiF is formed by reaction of the surface Si atom with the neutral fluorine atom, F+, or F- ion produced by scission of C-F bond of CF3Cl, C F2 Cl, or CFCl species. A kinetic model was proposed for the explanation of the photolysis of this submonolayer CF3Cl -covered surface. Based on this model and the variation rates of the F+ F- signals during fixed-energy monochromatic photon bombardment at 690.2 and 692.6 eV [near the F (1s) edge], the photolysis cross section was deduced as a function of energy.

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