Physical and structural properties of ZnO sputtered films

Walter Water, Sheng Yuan Chu

Research output: Contribution to journalArticlepeer-review

183 Citations (Scopus)

Abstract

In this paper, poly-crystal zinc oxide (ZnO) films with c-axis (002) orientation have been successfully grown on the silicon substrate by r.f. magnetron sputtering technique. The deposited films were characterized as a function of deposition temperature, argon-oxygen gas flow ratio, and r.f. power. Crystalline structures, stress and roughness characteristics of the films were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) measurement. By controlling deposition parameters and annealing temperature, we could improve intrinsic stress and surface roughness of ZnO film. Preferred deposition condition was found to show good film quality for SAW device applications.

Original languageEnglish
Pages (from-to)67-72
Number of pages6
JournalMaterials Letters
Volume55
Issue number1-2
DOIs
Publication statusPublished - 2002 Jul

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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