Plasma enhanced chemical vapor deposition silicon nitride for a high-performance lithium ion battery anode

Jinho Yang, Rhet C. De Guzman, Steven O. Salley, K. Y.Simon Ng, Bing Hung Chen, Mark Ming Cheng Cheng

Research output: Contribution to journalArticlepeer-review

23 Citations (Scopus)

Abstract

Silicon nitride thin films deposited by plasma enhanced chemical vapor deposition (PECVD) were evaluated for their performance as lithium ion battery anodes. PECVD is a mature technique in the semiconductor industry, but has been less utilized in battery research. We show that PECVD is a powerful tool to control the chemical composition of battery materials and its corresponding specific capacity. A 250 nm nitride anode was shown to have a stable reversible capacity of 1800 mAh g-1 with 86% capacity retention after 300 cycles. The capacity dropped for thicker films (1 μm), where it retained 76% after 100 cycles. The high reversible capacity of the PECVD nitride anode was attributable to a conductive Li3N matrix and excellent adhesion between PECVD films and copper current collectors.

Original languageEnglish
Pages (from-to)520-525
Number of pages6
JournalJournal of Power Sources
Volume269
DOIs
Publication statusPublished - 2014 Dec 10

All Science Journal Classification (ASJC) codes

  • Renewable Energy, Sustainability and the Environment
  • Energy Engineering and Power Technology
  • Physical and Theoretical Chemistry
  • Electrical and Electronic Engineering

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