Plasma treatment on plastic substrates for liquid-phase-deposited SiO 2

Chih Chieh Yeh, Yu Ju Lin, Shun Kuan Lin, Yeong Her Wang, Sheng Feng Chung, Li Ming Huang, Ten Chin Wen

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

The liquid-phase deposition method for growing silicon dioxide interlayers on O2 Ar plasma pretreatment plastic substrates is investigated. The authors found that the ratio of COO (288.9 eV) to C H2 (284.5 eV) increases with the O2 Ar plasma pretreatment as indicated by x-ray photoelectron spectroscopy. Upon treatment, the interlayer on the plastic substrate is grown, and the quality of the film on the substrate with or without plasma pretreatment is examined by using scanning electron microscopy, etching rate of the oxide layer by dilute HF solution, and surface leakage current measurement. Pentacene-based organic thin-film transistors on dielectric layers are demonstrated. Finally, they also found that this coating can enhance optical transmittance, as demonstrated by ultraviolet-visible spectroscopy measurement.

Original languageEnglish
Pages (from-to)1635-1639
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume25
Issue number5
DOIs
Publication statusPublished - 2007

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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