Polynomial fitting method of background correction for electron backscatter diffraction patterns

A raw electron backscatter diffraction (EBSD) signal can be empirically decomposed into a Kikuchi diffraction pattern and a smooth background. For pattern indexing, the latter is generally undesirable but can reveal topographical, compositional, or diffraction contrast. In this study, we proposed a new background correction method using polynomial fitting (PF) algorithm to obtain clear Kikuchi diffraction patterns for some applications in nonconductive materials due to coating problems, at low accelerated voltage and at rough sample surfaces and for the requirement of high pattern quality in HR-EBSD. To evaluate the quality metrics of the Kikuchi patterns, we initially used three indices, namely, pattern quality, Tenengrad variance, and spatial–spectral entropy-based quality to detect the clarity, contrast, and noise of Kikuchi patterns obtained at 5 and 15 kV. Then, we examined the performance of PF method by comparing it with pattern averaging and Fourier transform-based methods. Finally, this PF background correction is demonstrated to extract the background images from the blurred diffraction patterns of EBSD measurements at low kV accelerating voltage and with coating layer, and to provide clear Kikuchi patterns successfully.