Post-annealing effect upon optical properties of electron beam evaporated molybdenum oxide thin films

Shih Yuan Lin, Ying Chung Chen, Chih Ming Wang, Po Tsung Hsieh, Shun Chou Shih

Research output: Contribution to journalArticlepeer-review

59 Citations (Scopus)

Abstract

Molybdenum oxide (MoO 3 ) thin films were deposited by electron beam evaporation. The chemical composition, microstructure, optical and electrical properties of MoO 3 thin films depend on the annealing temperature and ambient atmosphere. X-ray diffraction (XRD) shows that crystalline MoO 3 films can be obtained at various post-annealing temperatures from 200 to 500 °C in N 2 and O 2 . X-ray photoelectron spectroscopy (XPS) results reveal that the O-1s emission peak was shifted slightly toward lower binding energies as the annealing temperature in N 2 was increased. The oxygen vacancies and conductivity of MoO 3 film increased with the annealing temperature. However, when the MoO 3 films were annealed in an atmosphere of O 2 , the optical transmission, the O/Mo ratio and the photon energy increased with the annealing temperature. The results differ from those for films annealed in a N 2 atmosphere.

Original languageEnglish
Pages (from-to)3868-3874
Number of pages7
JournalApplied Surface Science
Volume255
Issue number6
DOIs
Publication statusPublished - 2009 Jan 1

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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