Abstract
Molybdenum oxide (MoO 3 ) thin films were deposited by electron beam evaporation. The chemical composition, microstructure, optical and electrical properties of MoO 3 thin films depend on the annealing temperature and ambient atmosphere. X-ray diffraction (XRD) shows that crystalline MoO 3 films can be obtained at various post-annealing temperatures from 200 to 500 °C in N 2 and O 2 . X-ray photoelectron spectroscopy (XPS) results reveal that the O-1s emission peak was shifted slightly toward lower binding energies as the annealing temperature in N 2 was increased. The oxygen vacancies and conductivity of MoO 3 film increased with the annealing temperature. However, when the MoO 3 films were annealed in an atmosphere of O 2 , the optical transmission, the O/Mo ratio and the photon energy increased with the annealing temperature. The results differ from those for films annealed in a N 2 atmosphere.
Original language | English |
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Pages (from-to) | 3868-3874 |
Number of pages | 7 |
Journal | Applied Surface Science |
Volume | 255 |
Issue number | 6 |
DOIs | |
Publication status | Published - 2009 Jan 1 |
All Science Journal Classification (ASJC) codes
- General Chemistry
- Condensed Matter Physics
- General Physics and Astronomy
- Surfaces and Interfaces
- Surfaces, Coatings and Films