Preliminary study of run-to-run control utilizing virtual metrology with reliance index

Chi An Kao; Fan Tien Cheng; Wei Ming Wu

doi:10.1109/CASE.2011.6042446

Preliminary study of run-to-run control utilizing virtual metrology with reliance index

Chi An Kao, Fan Tien Cheng, Wei Ming Wu

Institute of Manufacturing Information and Systems

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

9 Citations (Scopus)

Abstract

Incorporation of virtual metrology (VM) into run-to-run (R2R) control is one of key advanced process control (APC) focus areas of International Technology Roadmap for Semiconductors (ITRS) for 2009. However, a key problem preventing effective utilization of VM in R2R control is the inability to take the reliance level in the VM feedback loop of R2R control into consideration. The reason is that the result of adopting an unreliable VM value may be worse than if no VM at all is utilized. The authors have proposed the so-called reliance index (RI) of VM to gauge the reliability of the VM results. This paper proposes a novel scheme of run-to-run control that utilizes VM with RI in the feedback loop.

Original language	English
Title of host publication	2011 IEEE International Conference on Automation Science and Engineering, CASE 2011
Pages	256-261
Number of pages	6
DOIs	https://doi.org/10.1109/CASE.2011.6042446
Publication status	Published - 2011 Dec 5
Event	2011 7th IEEE International Conference on Automation Science and Engineering, CASE 2011 - Trieste, Italy Duration: 2011 Aug 24 → 2011 Aug 27

Publication series

Name	IEEE International Conference on Automation Science and Engineering
ISSN (Print)	2161-8070
ISSN (Electronic)	2161-8089

Other

Other	2011 7th IEEE International Conference on Automation Science and Engineering, CASE 2011
Country/Territory	Italy
City	Trieste
Period	11-08-24 → 11-08-27

All Science Journal Classification (ASJC) codes

Control and Systems Engineering
Electrical and Electronic Engineering

Access to Document

10.1109/CASE.2011.6042446

Cite this

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title = "Preliminary study of run-to-run control utilizing virtual metrology with reliance index",

abstract = "Incorporation of virtual metrology (VM) into run-to-run (R2R) control is one of key advanced process control (APC) focus areas of International Technology Roadmap for Semiconductors (ITRS) for 2009. However, a key problem preventing effective utilization of VM in R2R control is the inability to take the reliance level in the VM feedback loop of R2R control into consideration. The reason is that the result of adopting an unreliable VM value may be worse than if no VM at all is utilized. The authors have proposed the so-called reliance index (RI) of VM to gauge the reliability of the VM results. This paper proposes a novel scheme of run-to-run control that utilizes VM with RI in the feedback loop.",

author = "Kao, {Chi An} and Cheng, {Fan Tien} and Wu, {Wei Ming}",

year = "2011",

month = dec,

day = "5",

doi = "10.1109/CASE.2011.6042446",

language = "English",

isbn = "9781457717307",

series = "IEEE International Conference on Automation Science and Engineering",

pages = "256--261",

booktitle = "2011 IEEE International Conference on Automation Science and Engineering, CASE 2011",

note = "2011 7th IEEE International Conference on Automation Science and Engineering, CASE 2011 ; Conference date: 24-08-2011 Through 27-08-2011",

}

Kao, CA, Cheng, FT & Wu, WM 2011, Preliminary study of run-to-run control utilizing virtual metrology with reliance index. in 2011 IEEE International Conference on Automation Science and Engineering, CASE 2011., 6042446, IEEE International Conference on Automation Science and Engineering, pp. 256-261, 2011 7th IEEE International Conference on Automation Science and Engineering, CASE 2011, Trieste, Italy, 11-08-24. https://doi.org/10.1109/CASE.2011.6042446

Preliminary study of run-to-run control utilizing virtual metrology with reliance index. / Kao, Chi An; Cheng, Fan Tien; Wu, Wei Ming.

2011 IEEE International Conference on Automation Science and Engineering, CASE 2011. 2011. p. 256-261 6042446 (IEEE International Conference on Automation Science and Engineering).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Preliminary study of run-to-run control utilizing virtual metrology with reliance index

AU - Kao, Chi An

AU - Cheng, Fan Tien

AU - Wu, Wei Ming

PY - 2011/12/5

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N2 - Incorporation of virtual metrology (VM) into run-to-run (R2R) control is one of key advanced process control (APC) focus areas of International Technology Roadmap for Semiconductors (ITRS) for 2009. However, a key problem preventing effective utilization of VM in R2R control is the inability to take the reliance level in the VM feedback loop of R2R control into consideration. The reason is that the result of adopting an unreliable VM value may be worse than if no VM at all is utilized. The authors have proposed the so-called reliance index (RI) of VM to gauge the reliability of the VM results. This paper proposes a novel scheme of run-to-run control that utilizes VM with RI in the feedback loop.

AB - Incorporation of virtual metrology (VM) into run-to-run (R2R) control is one of key advanced process control (APC) focus areas of International Technology Roadmap for Semiconductors (ITRS) for 2009. However, a key problem preventing effective utilization of VM in R2R control is the inability to take the reliance level in the VM feedback loop of R2R control into consideration. The reason is that the result of adopting an unreliable VM value may be worse than if no VM at all is utilized. The authors have proposed the so-called reliance index (RI) of VM to gauge the reliability of the VM results. This paper proposes a novel scheme of run-to-run control that utilizes VM with RI in the feedback loop.

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Preliminary study of run-to-run control utilizing virtual metrology with reliance index

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All Science Journal Classification (ASJC) codes

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