Preparation and characterization of copolymers containing (+)-bornyl methacrylate and their racemate for positive-tone photoresist

Jui Hsiang Liu, Jen Chieh Shih, Chih Hung Shih, Wei Ting Chen

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

This study investigated the chemical behavior of polymers bearing cycloaliphatic bornyl units along with the steric difference of the chiral (+)-bornyl methacrylate [(+)-BMA] and racemic (±)-BMA, expressed in the physical properties of the copolymers and the resist characteristics. To do this, a series of copolymers containing (+)-bornyl methacrylate [(+)-BMA] and [(±)-BMA] units was synthesized. Comonomers of tert-butyl methacrylate (TBMA), methyl methacrylate (MMA), and maleic anhydride (MA) were used. The thermogravimetric curves, glass-transition temperature (Tg), and molecular weight (MW) of the copolymers were evaluated. Exposure characteristics of chemical-amplified positive photoresists comprising various copolymers were investigated. It was found that copolymers bearing (±)-BMA have higher Tg and better thermostability than those of copolymers containing (+)-BMA units. The copolymers with (±)-BMA units, however, revealed an inert photochemical behavior on the positive-tone photoresist. The patterning properties of the positive photoresist, composed of copolymers bearing (+)-BMA and (±)-BMA, and the photoacid generator (PAG) were also investigated.

Original languageEnglish
Pages (from-to)3538-3544
Number of pages7
JournalJournal of Applied Polymer Science
Volume81
Issue number14
DOIs
Publication statusPublished - 2001 Sep 29

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Surfaces, Coatings and Films
  • Polymers and Plastics
  • Materials Chemistry

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