Preparation and characterization of molecular photoresists

Crosslinkable positive and water developable negative tones

Yin Yin Liao, Jui-Hsiang Liu

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

The development of a water-developable negative photoresist from β-CD using an acid-catalyzed chemical amplification method is investigated here. Tertiary butoxyl protected β-cyclodextrin (t-BOC-CD) is also synthesized and used to prepare a positive photoresist. Glutaraldehyde is added as a crosslinking agent for both positive and negative photoresists. Deprotection of t-BOC-CD is accelerated by a photo-induced acid. In the presence of glutaraldehyde and acid, both the deprotected t-BOC-CD and β-cyclodextrin are crosslinked. The introduction of a t-butoxyl group into the β-CD molecule and the addition of glutaraldehyde into the β-CD molecules are both found to decrease the crystallinity of the molecules, improving the resist film properties. The etching resistance of both positive and negative photoresist films is improved by the crosslinking method.

Original languageEnglish
Pages (from-to)3849-3858
Number of pages10
JournalJournal of Applied Polymer Science
Volume109
Issue number6
DOIs
Publication statusPublished - 2008 Sep 15

Fingerprint

Cyclodextrins
Photoresists
Glutaral
Water
Crosslinking
Molecules
Acids
Amplification
Etching

All Science Journal Classification (ASJC) codes

  • Materials Chemistry
  • Polymers and Plastics
  • Surfaces, Coatings and Films
  • Chemistry(all)

Cite this

@article{0a1cb00ae1c042798ac71e5b517d8d8d,
title = "Preparation and characterization of molecular photoresists: Crosslinkable positive and water developable negative tones",
abstract = "The development of a water-developable negative photoresist from β-CD using an acid-catalyzed chemical amplification method is investigated here. Tertiary butoxyl protected β-cyclodextrin (t-BOC-CD) is also synthesized and used to prepare a positive photoresist. Glutaraldehyde is added as a crosslinking agent for both positive and negative photoresists. Deprotection of t-BOC-CD is accelerated by a photo-induced acid. In the presence of glutaraldehyde and acid, both the deprotected t-BOC-CD and β-cyclodextrin are crosslinked. The introduction of a t-butoxyl group into the β-CD molecule and the addition of glutaraldehyde into the β-CD molecules are both found to decrease the crystallinity of the molecules, improving the resist film properties. The etching resistance of both positive and negative photoresist films is improved by the crosslinking method.",
author = "Liao, {Yin Yin} and Jui-Hsiang Liu",
year = "2008",
month = "9",
day = "15",
doi = "10.1002/app.28597",
language = "English",
volume = "109",
pages = "3849--3858",
journal = "Journal of Applied Polymer Science",
issn = "0021-8995",
publisher = "John Wiley and Sons Inc.",
number = "6",

}

Preparation and characterization of molecular photoresists : Crosslinkable positive and water developable negative tones. / Liao, Yin Yin; Liu, Jui-Hsiang.

In: Journal of Applied Polymer Science, Vol. 109, No. 6, 15.09.2008, p. 3849-3858.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Preparation and characterization of molecular photoresists

T2 - Crosslinkable positive and water developable negative tones

AU - Liao, Yin Yin

AU - Liu, Jui-Hsiang

PY - 2008/9/15

Y1 - 2008/9/15

N2 - The development of a water-developable negative photoresist from β-CD using an acid-catalyzed chemical amplification method is investigated here. Tertiary butoxyl protected β-cyclodextrin (t-BOC-CD) is also synthesized and used to prepare a positive photoresist. Glutaraldehyde is added as a crosslinking agent for both positive and negative photoresists. Deprotection of t-BOC-CD is accelerated by a photo-induced acid. In the presence of glutaraldehyde and acid, both the deprotected t-BOC-CD and β-cyclodextrin are crosslinked. The introduction of a t-butoxyl group into the β-CD molecule and the addition of glutaraldehyde into the β-CD molecules are both found to decrease the crystallinity of the molecules, improving the resist film properties. The etching resistance of both positive and negative photoresist films is improved by the crosslinking method.

AB - The development of a water-developable negative photoresist from β-CD using an acid-catalyzed chemical amplification method is investigated here. Tertiary butoxyl protected β-cyclodextrin (t-BOC-CD) is also synthesized and used to prepare a positive photoresist. Glutaraldehyde is added as a crosslinking agent for both positive and negative photoresists. Deprotection of t-BOC-CD is accelerated by a photo-induced acid. In the presence of glutaraldehyde and acid, both the deprotected t-BOC-CD and β-cyclodextrin are crosslinked. The introduction of a t-butoxyl group into the β-CD molecule and the addition of glutaraldehyde into the β-CD molecules are both found to decrease the crystallinity of the molecules, improving the resist film properties. The etching resistance of both positive and negative photoresist films is improved by the crosslinking method.

UR - http://www.scopus.com/inward/record.url?scp=55849122606&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=55849122606&partnerID=8YFLogxK

U2 - 10.1002/app.28597

DO - 10.1002/app.28597

M3 - Article

VL - 109

SP - 3849

EP - 3858

JO - Journal of Applied Polymer Science

JF - Journal of Applied Polymer Science

SN - 0021-8995

IS - 6

ER -