Preparation and characterization of novel polymers having pendant ketal moieties for positive photoresists

Jui Hsiang Liu, Jen Chieh Shih

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

This investigation relates to the syntheses of two new monomers of the methacrylate type and the introduction of the new monomers to a series of polymers for photoresists. In order to investigate the applications of pendant ketal and carboxyl groups on the positive tone photoresist, a series of copolymers have been synthesized deriving from methacrylic acid (MAA), methyl methacrylate (MMA), n-butyl methacrylate (BMA), 1.3-dioxane-4-methyl methacrylate (DDMA), and 1,4-dioxaspiro-[4,5]-decane-2- methyl methacrylate (DSDMA) with various feed molar ratio. We investigated the deprotection of pendant ketal groups, and the dehydration crosslinking of pendant carboxyl groups of the copolymers. The following were also investigated: thermogravimetric properties of copolymers, exposure characteristic curves, lithographic evaluation of the positive tone photoresist, and the effects of alicyclic groups on the plasma etching resistance of copolymers. It was found that polymers synthesized in this investigation can be used as a positive tone photoresist. A resolution of line and space pattern of 0.3 μm was a so achieved. Sufficient UV irradiation and heat treatment may cause the acid catalyzed dehydration crosslinking of pendant carboxyl groups to increase the efficiency of thermal resistance of polymers.

Original languageEnglish
Pages (from-to)2986-2991
Number of pages6
JournalMacromolecular Chemistry and Physics
Volume202
Issue number15
DOIs
Publication statusPublished - 2001 Oct 17

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Physical and Theoretical Chemistry
  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry

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