Preparation of heteroepitaxial LaNiO3 thin films on a SrTiO 3 substrate for growing an artificial superlattice with RF sputtering

Hsin Yi Lee; C. H. Hsu; Y. W. Hsieh; Yen Hua Chen; Yuan Chang Liang; Tai Bor Wu; L. J. Chou

doi:10.1016/j.matchemphys.2005.02.008

Preparation of heteroepitaxial LaNiO₃ thin films on a SrTiO ₃ substrate for growing an artificial superlattice with RF sputtering

Hsin Yi Lee
, C. H. Hsu
, Y. W. Hsieh
, Yen Hua Chen
, Yuan Chang Liang
, Tai Bor Wu
, L. J. Chou

Department of Earth Sciences

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

Abstract

High-quality heteroepitaxial LaNiO₃ (LNO) thin films were successfully grown on SrTiO₃ (STO) substrates with RF-magnetron sputtering deposition at substrate temperatures in a range 150-650 °C. Azimuthal scans around the surface Bragg peak of the film and lattice images from a high-resolution transmission electron microscope (HRTEM) show that a well epitaxial relationship between film and substrate is achievable through RF sputtering growth. BaTiO₃/SrTiO₃ (BTO/STO) artificial superlattices subsequently deposited on LNO-coated STO substrates with RF sputtering were found also to have a large dielectric constant and a small dissipation factor.

Original language	English
Pages (from-to)	585-590
Number of pages	6
Journal	Materials Chemistry and Physics
Volume	92
Issue number	2-3
DOIs	https://doi.org/10.1016/j.matchemphys.2005.02.008
Publication status	Published - 2005 Aug 15

All Science Journal Classification (ASJC) codes

General Materials Science
Condensed Matter Physics

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10.1016/j.matchemphys.2005.02.008

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@article{a08c039517564994a5d99a5eedfec5b6,

title = "Preparation of heteroepitaxial LaNiO3 thin films on a SrTiO 3 substrate for growing an artificial superlattice with RF sputtering",

abstract = "High-quality heteroepitaxial LaNiO3 (LNO) thin films were successfully grown on SrTiO3 (STO) substrates with RF-magnetron sputtering deposition at substrate temperatures in a range 150-650 °C. Azimuthal scans around the surface Bragg peak of the film and lattice images from a high-resolution transmission electron microscope (HRTEM) show that a well epitaxial relationship between film and substrate is achievable through RF sputtering growth. BaTiO3/SrTiO3 (BTO/STO) artificial superlattices subsequently deposited on LNO-coated STO substrates with RF sputtering were found also to have a large dielectric constant and a small dissipation factor.",

author = "Lee, \{Hsin Yi\} and Hsu, \{C. H.\} and Hsieh, \{Y. W.\} and Chen, \{Yen Hua\} and Liang, \{Yuan Chang\} and Wu, \{Tai Bor\} and Chou, \{L. J.\}",

note = "Funding Information: For support we thank National Science Council of the Republic of China (under contract No. NSC 92-2216-E-213-001) and Ministry of Education of the Republic of China (under contract No. A-91-E-FA04-1-4).",

year = "2005",

month = aug,

day = "15",

doi = "10.1016/j.matchemphys.2005.02.008",

language = "English",

volume = "92",

pages = "585--590",

journal = "Materials Chemistry and Physics",

issn = "0254-0584",

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TY - JOUR

T1 - Preparation of heteroepitaxial LaNiO3 thin films on a SrTiO 3 substrate for growing an artificial superlattice with RF sputtering

AU - Lee, Hsin Yi

AU - Hsu, C. H.

AU - Hsieh, Y. W.

AU - Chen, Yen Hua

AU - Liang, Yuan Chang

AU - Wu, Tai Bor

AU - Chou, L. J.

N1 - Funding Information: For support we thank National Science Council of the Republic of China (under contract No. NSC 92-2216-E-213-001) and Ministry of Education of the Republic of China (under contract No. A-91-E-FA04-1-4).

PY - 2005/8/15

Y1 - 2005/8/15

N2 - High-quality heteroepitaxial LaNiO3 (LNO) thin films were successfully grown on SrTiO3 (STO) substrates with RF-magnetron sputtering deposition at substrate temperatures in a range 150-650 °C. Azimuthal scans around the surface Bragg peak of the film and lattice images from a high-resolution transmission electron microscope (HRTEM) show that a well epitaxial relationship between film and substrate is achievable through RF sputtering growth. BaTiO3/SrTiO3 (BTO/STO) artificial superlattices subsequently deposited on LNO-coated STO substrates with RF sputtering were found also to have a large dielectric constant and a small dissipation factor.

AB - High-quality heteroepitaxial LaNiO3 (LNO) thin films were successfully grown on SrTiO3 (STO) substrates with RF-magnetron sputtering deposition at substrate temperatures in a range 150-650 °C. Azimuthal scans around the surface Bragg peak of the film and lattice images from a high-resolution transmission electron microscope (HRTEM) show that a well epitaxial relationship between film and substrate is achievable through RF sputtering growth. BaTiO3/SrTiO3 (BTO/STO) artificial superlattices subsequently deposited on LNO-coated STO substrates with RF sputtering were found also to have a large dielectric constant and a small dissipation factor.

UR - https://www.scopus.com/pages/publications/17444377588

UR - https://www.scopus.com/pages/publications/17444377588#tab=citedBy

U2 - 10.1016/j.matchemphys.2005.02.008

DO - 10.1016/j.matchemphys.2005.02.008

M3 - Article

AN - SCOPUS:17444377588

SN - 0254-0584

VL - 92

SP - 585

EP - 590

JO - Materials Chemistry and Physics

JF - Materials Chemistry and Physics

IS - 2-3

ER -

Preparation of heteroepitaxial LaNiO₃ thin films on a SrTiO ₃ substrate for growing an artificial superlattice with RF sputtering

Abstract

All Science Journal Classification (ASJC) codes

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