Properties of diamond-like carbon films deposited by ion plating with a pulsed substrate bias

Chia Yuan Hsu, Liang Yih Chen, Franklin Chau Nan Hong

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11 Citations (Scopus)

Abstract

Diamond-like carbon films of high quality were deposited using CH 4 by a magnetically enhanced ion plating system with a bipolar pulsed substrate bias (0-1000 V, 0-33 kHz). The flux and energy distribution of impinging ions could be individually controlled by the bias voltage and the duty cycle, defined as the percentage of ion acceleration time in the total pulse period. The effects of bias voltage and duty cycle on the structure and propeties of film were studied. Owint to charge accumulation on the surface, ion bombardment energy increases with decreasing the duty cycle. The film's hydrogen content decreases with decreasing the duty cycle. The film having the highest growth rate and the lowest internal stress can be obtained at a duty cycle of 88%, suggesting possible charge neutralization on the surface. In addition, the hydrogen content decreases with increasing the substrate bias and the film having the highest growth rate and high hardness can be deposited at a substrate bias of 600 V. A lower bias reduces the ion flux and ion energy forming a softer hydrogen-containing film, and a higher bias induces the re-sputtering effect and the formation of sp 2 carbon bonding in the film. Hardness and adhesion increase with increasing the substrate bias, except that hardness lightly decreases at the highest bias of 800 V, owing t o the extremely high ion energy bombardment enhancing the formation of sp 2 bonding. Ion energy is concluded to be crucial in determining the structure and properties of dimaond-like carbon films.

Original languageEnglish
Pages (from-to)884-891
Number of pages8
JournalDiamond and Related Materials
Volume7
Issue number6
DOIs
Publication statusPublished - 1998 Jun

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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