Properties of MgTiO₃ thin films prepared by RF magnetron sputtering for microwave application

Engineering & Materials Science

• Magnetron sputtering 100%
• Thin films 70%
• Microwaves 66%
• Substrates 52%
• Temperature 30%
• X ray diffraction 24%
• Microstructure 16%
• Crystal structure 16%
• Atomic force microscopy 15%
• Surface morphology 14%
• Electric properties 13%
• Permittivity 12%
• Sintering 11%
• Semiconductor materials 11%
• Capacitors 9%
• Scanning electron microscopy 9%
• Metals 8%
• Electric potential 6%

Physics & Astronomy

• magnetron sputtering 62%
• microwaves 50%
• thin films 38%
• temperature 22%
• mixing ratios 15%
• microstructure 14%
• MIS (semiconductors) 13%
• diffraction 13%
• x rays 11%
• capacitors 10%
• crystal structure 9%
• sintering 9%
• atomic force microscopy 9%
• grain size 9%
• electrical properties 9%
• permittivity 8%
• scanning electron microscopy 8%
• electric potential 6%

Chemical Compounds

• Magnetron Sputtering 86%
• Liquid Film 36%
• Point Group C∞V 23%
• Microstructure 20%
• Capacitor 15%
• X-Ray Diffraction 14%
• Grain Size 14%
• Dielectric Constant 13%
• Polycrystalline Solid 13%
• Dielectric Material 13%
• Electrical Property 12%
• Sintering 12%
• Atomic Force Microscopy 11%
• Scanning Electron Microscopy 8%
• Crystal Structure 7%
• Surface 4%