The quantitative analysis of Ti-Al-N films by Auger electron spectroscopy (AES) is not an easy task, mainly because of the overlapping of nitrogen and titanium in Auger signals and the Auger cross-transition of aluminum in nitrides. A quantitative AES analysis method was proposed in this report. The signal intensity of nitrogen was determined by subtracting the contribution of Ti from the overlapped signals (Dawson*s method). The sensitivity factors were determined following Hofmann*s derivation. X-ray diffraction was used for determining the critical N2 flow above which the ordered B1-NaCI structure of Ti-AI-N occurred. The relative sensitivity of Al/N from Hofmann*s derivation was then corrected using a AIN standard as the formation of aluminurn nitride was detected. The results of quantitative AES analysis for Ti-AI-N films by the method proposed in this report was in excellent agreement with that determined from the WDS with standards.
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry