Abstract
A dielectric barrier discharge-based micro-plasma stamp is used to transfer a micro-scale pattern onto ultra-thin octadecanethiolate (ODT) self-assembled monolayers chemically adsorbed on Au (111). The results show that the specified pattern was transferred onto ODT/Au with a distortion rate of less than 1% and no significant changes in the imprint dimensions. The adsorbates formed during plasma treatment or exposure to air affected the transfer of patterns. The wet-etching rate for the washed and patterned ODT/Au surface increased 1.6-fold compared to that for the unwashed one. The boundary of the underlaying Au pattern with plasma exposure increased ≈3% due to lateral diffusion of the Au etching solution.
Original language | English |
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Pages (from-to) | 345-352 |
Number of pages | 8 |
Journal | Plasma Processes and Polymers |
Volume | 10 |
Issue number | 4 |
DOIs | |
Publication status | Published - 2013 Apr |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Polymers and Plastics