Rapid micro-scale patterning of alkanethiolate self-assembled monolayers on au surface by atmospheric micro-plasma stamp

Chih Chiang Weng, Jen Chih Hsueh, Jiunn Der Liao, Chia Hao Chen, Masahiro Yoshimura

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

A dielectric barrier discharge-based micro-plasma stamp is used to transfer a micro-scale pattern onto ultra-thin octadecanethiolate (ODT) self-assembled monolayers chemically adsorbed on Au (111). The results show that the specified pattern was transferred onto ODT/Au with a distortion rate of less than 1% and no significant changes in the imprint dimensions. The adsorbates formed during plasma treatment or exposure to air affected the transfer of patterns. The wet-etching rate for the washed and patterned ODT/Au surface increased 1.6-fold compared to that for the unwashed one. The boundary of the underlaying Au pattern with plasma exposure increased ≈3% due to lateral diffusion of the Au etching solution.

Original languageEnglish
Pages (from-to)345-352
Number of pages8
JournalPlasma Processes and Polymers
Volume10
Issue number4
DOIs
Publication statusPublished - 2013 Apr 1

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All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Polymers and Plastics

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